Particle inspection system for unpaterned wafers
We're pleased to introduce LASER SCANNING solutions for SILICON wafers, SILICON CARBIDE, COMPOUND SURFACE INSPECTION.
Dedicated Lasers wavelength and specific optics design allow our laser scanning equipment, to inspect OPAQUE and TRANSPARENT SUBSTRATES with equal accuracy and sensitivity.
EUMETRYS has a comprehensive portfolio of equipments to cover Industrial, Pilot line or R&D Lab SURFACE CHARACTERIZATION and inspection needs.
Applications like: INCOMING QUALITY CONTROL, EQUIPMENT MONITORING, PROCESS QUALIFICATION and R&D study can be covered with efficiency at a very attractive Cost of ownership.
High productivity (fast scan), Excellent resolution (> 0,1 um sensitivity) can inspect bulk or films (EPI, Poly, Metal, Dielectrics and more).
Substrates like Si; SiC; GaN, LT; LN; Sapphire; Glass from 3” to 8” in diameter or square automatically.