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Impedans Ltd is a leading provider of innovative solutions in the field of plasma technology. With a focus on precision, accuracy, and quality, the company has established itself as a trusted partner for customers across a range of industries, including semiconductor manufacturing, research and development. With a team of experienced scientists, engineers, and technicians, Impedans is dedicated to delivering cutting-edge technology and unparalleled customer support to help drive progress and discovery in the world of plasma science.
Our sensors help advance our understanding of complex plasma systems in university plasma physics labs worldwide
Our technology helps research institutes create innovative solutions in many fields of research
Sub-system suppliers apply our technology to help deliver reliable accurate subcomponents to equipment makers.
Plasma equipment makers utilize our sensors in their development and field support teams but also often integrate our sensors on their tools.
Our sensors are used globally by semiconductor device manufacturers for process development, live process monitoring and equipment maintenance.
Plasma is used by vacuum coating, solar, aerospace, military, medical and many other industries and our solutions help them to achieve their goals
Impedans sensors are widely utilized in plasma physics research to accurately measure and analyze plasma and RF properties.
Impedans sensors play a crucial role in the development of modern equipment by providing precise measurements of plasma and RF properties and allowing for real-time monitoring and optimization
Our sensors are valuable tools in plasma process development, allowing real-time monitoring of the plasma and helping optimize the conditions for specific applications
Impedans technology is widely used as a calibration and verification standard for RF, providing a precise and reliable method for measuring and comparing RF properties.
Our sensors are widely used for process monitoring in various industries, providing precise and real-time measurements of plasma properties and enabling effective control and optimization
We provide essential tools for maintenance and repair providing real-time measurements of plasma and rf properties, allowing technicians to quickly identify and resolve issues with equipment
Measure the fundamental plasma parameters such as the ion density, electron temperature and plasma potential with our state of the art Langmuir probes
Measure the ion energy and ion flux impacting on your substrate with our RFEAs – rapidly characterize your plasma chamber under different power, pressure, frequency and gas flow conditions
Measure rf power and impedance using our in-line 1% accurate Octiv VI probes for multiple fundamental and harmonic frequencies to get a direct view of your plasma
A global company that caters to markets in US, Europe and Asia.
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Achieve a perfect Etch Profile: Insights from Plasma Diagnostics for RIE – Lag and HAR Solutions
The semiconductor industry increasingly relies on etching processes to define the shape and precision of features at technology nodes with sub nanometer dimensions. Join our next webinar where we will address the solutions for real world challenges like RIE Leg and HAR etch utilizing ion energy measurements.
What you will learn?
– Understand ion behaviors in etching process at different process conditions such as RF frequencies, substrate biasing.
– Explore the role of neutrals in etching via measurements of ion-to-neutral ratios.
– Monitor and Control of ‘RIE lag’ issue with measurements of ion energies at different incident angles.
Date – 18th June
Time – 15:00 GMT
