CHUGAI RO CO., LTD.

Contributes to enhanced productivity thanks to a space-efficient design tailored for mass production!
Because HEPA filters are not used, a cleanliness class equivalent to that of an IR oven is achieved (class10).
This unit also significantly outperforms conventional hot air ovens in terms of heating/heat-up capacity and uniformity of temperature.
Because it relies on hot air circulation, the amount of N2 and electricity used is half that of an IR oven, thus providing outstanding energy efficiency. Also, the entire furnace chamber is heated, thus preventing condensate and sublimate from adhering to the furnace chamber walls and, thus, ensuring no reduction in operating rate due to periodic cleaning.

■Principal Applications

PI curing (e.g., flexible OLED), annealing, dehydrogenation or other treatments for TFT, baking for frit sealing (OLED) or other glass
■Unit Specifications

1. Substrate size: G2.5 – G8.5
2. Heating method: Convection-type (heated air circulation-type)
3. Maximum temperature: Max.550°C
4. Temperature precision: ΔT = ≤ 9°C
5. Heat-up/cool-down rate: Up rate = 7°C/min Down rate = -7°C/min (Ave.)
6. Cleanliness class: Class10
7. Atmosphere: Air or N₂ gas (pure N₂)
8. Furnace interior O₂ concentration: ≤ 10ppm (when using pure N₂)

• Capable of high-viscosity liquid thick coating application (even single applications of thick coatings with coating thicknesses of hundreds of μm)
• Superior ability to embed liquid in patterns (with very few voids)
• No need for EBR (Edge Back Rinse), thereby reducing the number of processes involved
• Keeps liquid loss to a bare minimum (the quantity of coating liquid applied is less than 1/3 that of a Spin Coater)
• Cleaning and waste fluid volume are both greatly reduced, contributing to more eco-friendly manufacturing
• Capable of coating materials with special forms and of special forms of coating (refer to the form examples below)