■Atomic-Antialiasing Annealing Minimal Fab Tool
This system is equipped with a new technology based on hydrogen laser annealing technology developed jointly by Professor Yoshiaki Kanamori of TOHOKU University, AIST, and theMinimal Fab Promoting Organization.
A reference video (here) is available. Please refer to it as well.
◆Features
φ12.5 mm wafers (single wafer processing)
Compact body (approx. 30 cm wide)
No clean room required
Low power consumption (rated AC100V 10A)
Ultra-high vacuum (5 × 10 -5 Pa or less)
Rapid temperature rise and fall (up to 1100°C in 2.5 seconds)
Stable temperature control (1100°C ±0.5°C)
Uniform temperature distribution (Variation (σ/Ave.) 0.5%)