특장점
√ 국내 시장 점유율 1위 !
√ 풍부한 해외 납입 실적 (미국,일본,중국 4,000여대)
√ 내구성 향상을 위한 다양한 기술 보유
√ 안정적인 시스템 구조 및 데이터 처리 방식
√ 다양한 공정 적용 경험 및 노하우
Customer Benefits
√ Technical expertise, all products developed our own technology
√ Continuous upgrade in the application in response to customer feedback
√ H/W, S/W customization options available to fit customer needs
1. Application
- PVD, (PE)CVD, (PE)ALD, Etcher, all TM @semiconductor/display manufacturing
- Ti TM/PM, W PM, WN TM/PM/Ex, TSN TM, C&C(Si etch) TM, OxALD PM, Diffusion PM
- In-situ leak detection
- ALD Source monitoring
- Dry cleaning endpoint optimization
- Process fault detection
- In-situ fault detection caused by any chamber condition’s changes
- Necessary in-situ gas monitoring to prevent unexpected process accident
2. Features
- RF plasma ignition : 0mT~10Torr
- In-situ monitoring for 200~850nm
- Use highly sensitive CCD sensor(2,048pixels)
- Advanced EPD algorithms : Fine leak detection algorithm, Life time management