SEIWA OPTICAL CO,.LTD.

Nakano-ku,  Tokyo 
Japan
http://www.seiwaopt.co.jp
  • Booth: A1057

  Products

  • Wafer Cassette FOUP/FOSB Inspection System
    A device that measures the outer diameter of wafer cassettes FOUP/FOSB/OC (wafers can be inserted)
    Measure and inspect top flanges, side forklift flanges, wafer mounting step pitches and registration pinholes from various angles....

  • Specification:
    ・Compatible with FOUP/FOSB/OC of various manufacturers
       In addition to the standard size of φ300mm, color cassettes can also be inspected.
    ・The 25-megapixel camera and dedicated optical engine enable high-definition external dimensions!
    ・Ultra-wide-field high-speed processing achieves the fastest throughput in the industry

    https://bit.ly/4482XE2

  • Wafer Review Equipment
    Device for detailed analysis of NG images, storage of analysis data, and communication with host PC based on information provided by wafer inspection system....

  • [Use]
    Defect management in semiconductor device / CMOS device manufacturing process

    [Specification]
    Applicable work size: 12 inch / 8 inch
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    Work state: Wafer dicing
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    Stage positioning accuracy: ± 1um
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    Review accuracy: 3σ ≤ ± 20um
    * Positioning accuracy for defect information coordinates
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    Throughput: Approximately 2000 seconds (10-sheet processing)
    * Number of defects: 100 / piece
    * Reference imaging mode
    * Depends on defect location
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    Review (moving to AF to imaging) time: fastest 0.5 seconds
    * Depends on defect location
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    The System takes defect images and the datum are upladed to the upstream system.
    The defect infomation is provided by Wafer Review System and Wafer Inspection System; AVI.
    The System also analyzes the defect information from AVI.
    Seiwa SAWR Series inspect your application at high speed with high precision.
    We can also manufacture AVI.

    https://bit.ly/4482XE2

  • Wafer Exposure System (Mask Aligner)
    Fully Automatic type (for 2-12 inch or square shape)
    ...

  • [Overview]
    is adopted an original UV optical system optimized for high-definition exposure and a mechanism
    that allows the photo-mask and wafer to be paralleled with high precision.

    This Fully Automatic Exposure System support 3 kinds of Gap control such as "Vacuum contact", "Soft Contact", and "Proximity Gap".

    [Use]
    Power device, Back side of C-MOS, MEMS, LED, Ceramics etc.

    [Specification]
    Available Wafer size : 12 inch, 6-8 inch, 4-6 inch, 2-4 inch or Square shape etc.
    Loading method : Cassette to Cassette, Foup Load
    Alignment direction : Top side, Back side (Option)
    Alignment Accuracy : Top side ±0.8μm or less / Back side ±1μm or less

    https://bit.ly/40KcBtx

  • Full Automatic Exposure system for LED chip
    [OverView]
    There are the following 2 type of Full Automatic Exposure System for LED.
    2-4 inch combined use type, and 4-6 inch combined use type...

  • [Use]
    For Micro LED or LED

    [Specification]
    Tact Capacity :1st 150pcs or more/ 1hour
           :2nd 130pcs or more/1hour
    Alignment Accuracy:0.5μm or less

    https://bit.ly/40KcBtx

  • UV Laser Maker
    UV Laser Marking System...

  • Overview


    Equipped with 355nm UV laser
    Laser oscillator, optical system, control integrated type
    Air-cooled specifications that do not require cooling water
    Laser maximum output 3W and also compatible with processing machines
    Built-in CCD camera that can be observed coaxially with the laser
    Can be equipped with a telecentric lens for processing machine applications

    https://bit.ly/41ey4Ll

  • Laser Auto Focus Unit
    Sample Rate Max 5kHz
    Faster autofocus and large improvement in productivity...

  • Overview

    High speed tracking contributes to reduce the takt time
    Perfect surface inspection of high reflection rate target such as wafer or glass
    Selectable camera interface
    Optical system can be customized according to your purpose

    Specification

    LAF5S-C 670mm 45 degree diagonal

    Laser type : Semiconductor laser

    Safety standard class : 3R

    Positioning time : External trigger 0.2 sec

                              Tracking 0 sec

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