SKN Industrial Supplies Sdn Bhd

To develop sealing solutions that perform in difficult applications, last longer, require less maintenance and deliver the lowest cost of ownership.

PPE provides clean room manufactured seals with low particle and low trace metal contamination for minimized yield loss and low chemical erosion rates that offer the following benefits:-

• Extended system up-time
• Increased mean time between failure (MTBF)
• Decreased wet clean or mechanical clean frequency
• Minimized cost of ownership (CoO) through reduced cost of consumables (CoC)

Elastomer material recommendation is dependent on process chemistry, temperature, specific hardware location, proximity to the substrate, device type being manufactured and technology node.  PPE offers a wide range of materials from its Perlast®, Kimura® and Nanofluor® ranges and is able to intelligently match the perfect material to the process type, system location and end user product complexity.

Omniseal Solutions™ is an industry leader in designing and manufacturing high performance sealing and wear solutions for the Semiconductor fabrication process. These material and component solutions are used in Wafer cleaning, Etching, PVD/CVD, CMP, Testing processes, among others.

OMNISEAL® SPRING-ENERGIZED SEALS

High Performance & Long Life

• Excellent in many sealing environments & temperatures (-450⁰F to 600⁰F)

• Improved performance over elastomeric seals

OMNISEAL® METAL SEALS

High Temperature & High Pressure

• Ideal solution when polymer seals reach limit in terms of temperature & pressure

• Extreme low leakage (10-10cc/sec He)

MELDIN® POLYIMIDES

High Temperature & High Purity

• Best polymer solution for plasma environment (low etching)

• High dimensional stability at high temperatures (intermittent up to 900⁰F)

• Available in stock shape & direct-formed,finished parts

Furon® and Versilon® product lines, an extensive product line of high-purity fluid handling components. Our standard product line includes pumps, valves, fittings, and accessories.

Application on Chemical Delivery, Wafer Processing, CMP, , Precision Dispenser and High Temperature.Saint-Gobain is a leading manufacturer of Furon manifolds, tubing and other fluid delivery components for point of use silicon wafer processing (POU) applications, including chemical mechanical polishing, wet etching, electrochemical deposition and cleaning.

Furon Valves from Saint-Gobain are ideal for fluid delivery applications where aggressive chemicals, ultra-pure chemicals, chemical mechanical polishing liquids and slurries are transferred. Designed with state-of-the-art, patent-protected technology, our valves offer improved flow capabilities and stronger performance against back pressure, resulting in higher process efficiency and reduced operations downtime.

Versilon Hoses from Saint-Gobain are made from high-purity fluoropolymer and designed for safety, performance and cleanliness for semiconductor applications. Our hose line is constructed with unpigmented PFA fluoropolymer inner core offering a wide range of temperature capabilities and has superior chemical resistance.

Contact us today to know more about our extensive product range.

RENA offers an extensive product portfolio in wet processing of semiconductor wafers.

We manufacture manual, semi-automated and fully-automated equipment as well as custom designed chemical stations with outstanding process control.

RENA’s versatile wet processing platforms and technologies can be utilized both in front-end-of-line (FEOL) and back-end-of-line (BEOL) applications to fabricate integrated circuits (IC), MEMS sensors, photonic, RF and power devices.

Platforms

• Bare Wafer Processing
• Batch Immersion
• Batch Spray
• ElectroPlating
• Wafer Drying
• Single Wafer Processing
• Chemical Delivery Systems

ESI has been providing unique innovative upgrades, cost-effective technical solutions, high quality equipment worldwide since 1986. ESI offers Plasma Etcher and Asher equipment for the Semiconductor, MEMS, Biomedical, Nanotechnology & LED industries.

Unique Plasma tools, the e3611 and e3612

NEW SINGLE WAFER ASHING SYSTEMS

Features of E3611 and E3612

• One or Two Chamber
• RF Plasma or Microwave Plasma
• Wafer Cooling Stations
• Dual Arm Pick and Place Robot with wafer map
• Two Cassette Holders for 100mm to 200mm wafer sizes
• Ethernet Smart Control Systems
• Light Tower
• ULPA (Ultra Low Particulate Air) System