This is to replace traditional method of wafer fixing during Chemical Mechanical Polishing (CMP) process. No more worry of waxy residue and wax cleaning process. It offers cushion benefit for best protection for various kinds of wafers. Together with slurry, the poromeric material of template absorbs sufficient moisture after wetting and produces necessary adhesion to hold the wafer well. The superior performance of template can reduce machine down time and increase productivity.
It can be used for single-sided polishing applications.
It is applied to coarse, middle and fine polishing during the Chemical Mechanical Polishing (CMP) process. With advance PU foaming technology, high planarization and removal rate can be achieved. NDS polishing pads are customized for polishing varieties of workpieces such as silicon wafers, reclaim wafers, SiC, GaAs, sapphire, quartz, ceramic and etc.