Allwin21 Corporation

220 Cochrane Circle
sales@allwin21.com
Morgan Hill,  CA  95037

United States
http://www.allwin21.com
  • Booth: 1245


We look forward to seeing you at Booth 1245 at Semicon West

Allwin21 Corp. is the exclusive licensed manufacturer of AG Associates Heatpulse 610 Rapid Thermal Processing equipment.  We are manufacturing the new AccuThermo AW Series Atmospheric Rapid Thermal Processors and Vacuum Rapid Thermal Processors.  Compared with traditional RTP systems, Allwin21's AccuThermo AW RTPs have innovative software and more advanced temperature control technologies to achieve the BEST rapid thermal processing performance (repeatability, uniformity, and stability) with decades of research directly applicable to ours.

We focus on extending product lifecycle, providing solutions, and engineering enhancements to many used semiconductor process equipment (lately more directly related to III-V, InP, GaAs processing).  These OEM semiconductor equipment have been used in production and R&D since the 1990′s.  They have proven processes and research.  Allwin21 Corp. can customize these OEM systems with Allwin21′s comparable integrated process control system with PC, solid robotic wafer transfer system, and new critical components.  This is to achieve the goal of giving our customers a production edge, with right cost, and without having to worry about obsolete parts.

Allwin21 Corp. Morgan Hill
Allwin21 Corp.
was formed in 2000 with a focus on professionally providing Rapid Thermal Process, Plasma Asher Strip / DescumPlasma Etch/RIE, and Sputter Deposition high-tech semiconductor equipment, services and technical support in Semiconductor, MEMS, Biomedical, Nanotechnology, Solar, & LED industries.  We endeavor to be a leader in our product lines. To achieve this, we have been providing unique innovative and cost-effective technical solutions, high quality equipment, and on time spare parts delivery worldwide.  We have maintained a global presence that has grown and expanded into the major high-tech manufacturing areas of the world.  We pride ourselves on developing and continuing lasting customer relationships.

We understand that a timely responsive  support and service are critical elements in semiconductor industries. Allwin21's experienced engineer team is the best guarantee for high quality service and support.  We provide on-site installation, training, maintenance, system optimization, retrofits, and/or customized upgrades.


 Press Releases

  • Allwin21 Corp. has been focusing on providing solutions and enhancements to Perkin-Elmer 4400Perkin-Elmer 4410Perkin-Elmer 4450 used sputter deposition semiconductor process equipment. These OEM semiconductor equipment have been used in productions and R&D since 1990′s. They have been proven to be a true “work horse”. Allwin21 Corp. can customize these OEM systems with Allwin21′s comparable integrated process control system with PC and new critical components. We rebuildAccuSputter AW 4450 Series Sputter Deposition systems with our own integrated process control system, giving our customers the tools to achieve a production edge at very low cost impact.

     

    AccuSputter AW 4450 Sputter

    Manufacturer: Allwin21 Corp. | Condition: New | Wafer Size: Small~8 inch |  Wafer loading: Manually, with load lock | Cathodes: Delta Shape/Up to 3 sets OR Circle Shape/4″~6″/Up to 4 sets | Sputter Methods: DC/RF;Diode/Magnetron | Gas Lines: 1~3 lines with customized MFCs range



    Sputter Deposition Equipment- AccuSputter AW 4450
     
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    Perkin-Elmer 4400 Sputter

    Manufacturer: Perkin-Elmer | Condition: Fully Refurbished and Upgraded | Wafer Size: Small ~ 6 inch |  Wafer loading: Manually, with load lock | Cathodes: Circle Shape/4"~6"/Up to 4 sets | Sputter Methods: DC/RF; Diode/Magnetron | Gas Lines: 1 ~ 3 lines with customized MFCs range

     
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    Perkin-Elmer 4410 Sputter

    Manufacturer: Perkin-Elmer | Condition: Fully Refurbished and Upgraded | Wafer Size: Small~8 inch | Wafer loading: Manually, with load lock | Cathodes: Delta Shape/Up to 3 sets | Sputter Methods: DC/RF; Diode/Magnetron | Gas Lines: 1 ~ 3 lines with customized MFCs range

     
    Continue Reading

    Perkin-Elmer 4450 Sputter

    Manufacturer: Perkin-Elmer | Condition: Fully Refurbished and Upgraded | Wafer Size: Small ~ 8 inch |  Wafer loading: Manually, with load lock | Cathodes: Delta Shape/Up to 3 sets | Sputter Methods: DC/RF; Diode/Magnetron | Gas Lines: 1 ~ 3 lines with customized MFCs range

     
    Continue Reading
  • Wafer Size: 2″ – 6″ Capability

    Wafer Loading: Manual
    Metal Thickness Range: 100Å – 270kÅ
    Metal Sheet Resistance Range: 1mΩ/square – 9,990Ω/square
    Downloads: AWgage-150 (PDF)

     

     

     

     

    AWgage-150 measures sheet resistance in ohms per square or milliohms per square. If specific resistivity is known, the thickness of the deposited film layer can be computed from the sheet resistance. The choice of measurement data is easily get in the software. AWgage-150 can accommodate 150mm (6″) wafers as well as the standard 2″, 3″,4″, 5″ wafers without any hardware change.

    Allwin21 AWgage-150 Features:

    • 30 years proven Eddy Sheet Resistance Measurement technologies.
    • Non-contact Sheet Resistance Measurement technologies.
    • 1m W/square to 19,990 W/square measurement range
    • Touch Screen Monitor and PC w/ Advanced Allwin21 control software.
    • Wafer carriage travel programmed with internal encoder step motor , without encoder disk.
    • Consistent wafer-to-wafer process cycle repeatability.
    • Small footprint and energy efficiency.
    • Made in U.S.A.

    Specifications:

    • Test Sights: Single center-point, 5-point, or 9-point.5-9
    • Highly Conductive or Metal Sheet Resistance:
      • 1 to 1,999 mW/square
      • 1 to 1,999 W/square
      • 10 to 19,990 W/square
    • Highly Conductive or Metal Film ThicknessMinimum: 100 ÅngströmMaximum: Proportional to resistivity. Maximum for a resistivity of 2.7 mW-cm is 270 kÅ (27 mm)

    Sheet Resistance RepeatabilityTotal repeatability is the standard deviation (s) percent of mean value(X),1 count.

    Range s/X (±%)
    1 to 100 mW/sq; W/sq 1
    100 to 500 mW/sq; W/sq 2
    500 to 1000 mW/sq; W/sq 4
    1000 to 1,999 mW/sq; W/sq 6
    1,999 to 5,000 W/sq Consult Factory
    5000 to 10,000 W/sq Consult Factory
    10,000 to 15,000 W/sq Consult Factory

    Configuration:

    • Main Frame
    • Wafer Carriage (2”-6”)
    • Measurement Head
    • RF Tank Circuit board
    • Pentium® class computer board
    • Main control board
    • Motor control board.
    • Two USB Ports
    • Two Extra DB9 Ports
    • 15–inch touch screen GUI
    • Allwin21 Corp proprietary software package.
    • Mouse & Keyboard
    • USB Flash Drive with AW Software backup.
    • CE Mark if necessary

    Facilities:

    • Place the instrument on a hard surface. Do not operate it on a cushioned surface
    • The room temperature should be close to 23° C for the greatest measurement accuracy.
    • Avoid environments with high concentrations of particulates, especially abrasives such as glass and silicon dust.
    • Power : 50/60Hz, Single Phase, 110/220VAC, 2 Amps
    • Weight and Dimensions: 44 LBs ; 11 inch (W) X 18 inch (D) X 22 inch (H)

     

    1. Exclusive licensed manufacturer of Heatpulse 610 of AG Associates.
    2. Advanced Allwin21 Real Time PC Control Technology.
    3. Focus on Production-Proven process technology.
    4. Integrated 3-axis solid robotic wafer transfer technology.
    5. Experienced local engineer support.
    6. Products made in U.S.A

    Main Products:

    Plasma Ash/Descum

    Metal Film Metrology

    Allwin21 Corp. is the exclusive licensed manufacturer of AG Associates Heatpulse 610 Rapid Thermal Process tool.  We are manufacturing the new AccuThermo AW Series Atmospheric and Vacuum Rapid Thermal Processors. Compared with traditional RTP systems, Allwin21’s AccuThermo AW RTPs have innovative software and more advanced real time temperature control technologies to achieve the BEST rapid thermal processing performance (repeatability, uniformity, and stability) with decades of research directly applicable to ours.

    We focus on extending product lifecycle, providing solutions, and engineering enhancements to many production proven semiconductor process equipment most directly related to III-V processing.  These semiconductor equipment have been used in production and R&D since the 1990′s.  They have proven processes and research.  Allwin21 Corp. can customize these systems with Allwin21′s comparable integrated process control system with PC, solid robotic wafer transfer system, and new critical components.  This is to achieve the goal of giving our customers a production edge, with right cost, and without having to worry about obsolete parts.

    Allwin21 Corp. was formed in 2000 with a focus on professionally providing Rapid Thermal Process, Plasma Asher Strip / Descum, Plasma Etch/RIE, Sputter Deposition and Metal Film Metrology high-tech semiconductor equipment, services and technical support in Semiconductor III-V, MEMS, Biomedical, Nanotechnology, Solar, Battery & LED industries.  We endeavor to be a leader in our product lines. To achieve this, we have been providing unique innovative and cost-effective technical solutions, high quality equipment, and on time spare parts delivery worldwide.  We have maintained a global presence that has grown and expanded into the major high-tech manufacturing areas of the world.  We pride ourselves on developing and continuing lasting customer relationships.

    We understand that a timely responsive support and service are critical elements in semiconductor industries. Allwin21’s experienced engineer team is the best guarantee for high quality service and support.  We provide on-site installation, training, maintenance, system optimization, retrofits, and/or customized upgrades.

     

     


 Products

  • AccuThermo AW 610 , the most popular RTP
    The AccuThermo AW610 was derived from the AG Associates 610 production-proven design. Allwin21 Corp. is the exclusive manufacturer of the AG Associates Heatpulse 610 desktop atmospheric RTP (Rapid Thermal Processing) system...

  • The AccuThermo AW610 was derived from the AG Associates 610 production-proven design.  Allwin21 Corp. is the exclusive manufacturer of the AG Associates Heatpulse 610 desktop atmospheric RTP (Rapid Thermal Processing) system.  The system uses high intensity visible radiation to heat single wafer for short process periods of time at precisely controlled temperatures. The process periods are typically 1 600 seconds in duration, although periods of up to 9999 seconds can be selected. These capabilities, combined with the heating chamber's cold-wall design and superior heating uniformity, provide significant advantages over conventional furnace processing.

    Key Features:

    1. 35 years’ production-proven Real RTP/RTA/RTO/RTN system.
    2. Scattered IR light by special gold plated Al chamber surface.
    3. Allwin21 advanced Software package with real time control technologies and many useful functions.
    4. Consistent wafer-to-wafer process cycle repeatability.
    5. Top and bottom High-intensity visible radiation Tungsten halogen lamp heating for fast heating rates with good repeatability performance and long lamp lifetime.
    6. Cooling N2 (Or CDA) flows around the lamps and quartz isolation tube for fast cooling rates
    7. Elimination of external contamination by Isolated Quartz Tube
    8. Up to six gas lines with MFCs and shut-off valves
    9. Energy efficient.
    10. Made in U.S.A.
    11. Small footprint

     

    Other RTP Models:

     

    Rapid Thermal Process, Rapid Thermal Processing, Rapid Thermal Anneal, Rapid Thermal Annealing, Rapid Thermal Oxidation, Rapid Thermal Nitride, RTA, RTP, RTO, RTN,, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, AG210, AG310, AG 410, AG610, AG 610I, AG Associates, Heatpulse 210, Heatpulse 410, Minipulse 310, Heatpulse 610, Heatpulse 610I, AG Heatpulse 410, AG Heatpulse 610, AG Heatpulse 210, AG Minipulse 310, Atmospheric Rapid Thermal Process, Vacuum Rapid Thermal Process, Furnace, Oven, Thermal Furnace, Thermal Process, Thermal Processing,JIPELEC, ag2146,JetClip,JetStar, AST SHS2000, AST STEAG 2800,  ssintegration, Rapid Thermal Oxide,JetFirst ,Mattson, annealsys, heatpulse ,ag 2146,Koyo Thermo Systems,AST STEAG-MATTSON 2800, heat pulse, Solaris, Eclipse ,modularpro, RLA-1000, AG Heatpulse,  rapid thermal processor, Steag AST SHS2000, Solaris 75, Solaris75,STEAG Electronic Systems ,eng-sol, Annealsys, RLA-3000, Engineering Solutions ,Solaris 150, Rapid Thermal Annealer , AS-Master ,modularpro,RTO ,Modular  Process Technology, Solaris150,AS-One,AS-Micro,

  • AW-105R Plasma Asher Descum for III-V Materials
    The AW-105R single-wafer photoresist asher and descum is an automated tool designed as a flexible 13.56MHz RF Parallel Plate plasma photoresist removal and descum system for high-volume wafer fabrication....

  • The AW-105R single-wafer photoresist asher and descum is an automated tool designed as a flexible 13.56MHz RF Parallel Plate plasma photoresist removal and descum system for high-volume wafer fabrication. The AW-105R is in direct response to manufacturer’s concerns for wafer uniformity, uptime, reliability and production-proven technology.

    Key Features:

    1.  Production-proven plasma Asher/Descum system.
    2.   Integrated solid robotic wafer handling, Single wafer process.
    3.   Up to 3%-5% Uniformity. Best for III-V Materials.
    4.   Frontside and backside isotropic removal.
    5.   Consistent wafer-to-wafer process cycle repeatability. 
    6.   Element heating for up to 250oC. 
    7.   50mm-150mm wafer capability. Up to 6.25” substrate. 
    8.   Up to 4 wafer size capability without hardware change.
    9.   Fixed cassette station and wafer aligner/cooling station.
    10.   Can handle 50um thickness wafer.
    11.   PC controller with Advanced Allwin21 Software.
    12.   Endpoint detection (EOP) with Allwin21 SLOPE technology (Optional).
    13.   Up to 3 gas lines with MFC.
    14.   Air-Cooled 600W MKS 13.56 MHz RF Generator (300W Option).
    15.   Pressure control with Throttle Valve.
    16.   15-inch Touch screen monitor GUI.
    17.   EMO, Interlocks, and Watchdog function.
    18.   GEM/SECS II (optional).
    19.   Small Footprint: 27”W x 40”D x 59”H   (280LBs)
    20.   Made in U.S.A.

     

    All Plasma Asher Plasma Descum Equipment from Allwin21 Corp.

    Keywords: Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Matrix 105, Matrix 205, Matrix 303, Matrix 403,Matrix 106,Matrix 104, Matrix 102,Matrix 101, Matrix 10,  System One Stripper, Model 105, System One Etcher, model 303, model 403

  • AW-901e / AW-903e Plasma Etch
    The AW-901eR & AW-903eR single-wafer dry etchers are automated tools designed as a flexible 13.56MHz RF Parallel Plate plasma etching systems for high-volume wafer fabrication....

  • The AW-901eR & AW-903eR single-wafer dry etchers are automated tools designed as a flexible 13.56MHz RF Parallel Plate plasma etching systems for high-volume wafer fabrication. AW-901eR & AW-903eR are in direct response to manufacturer’s concerns for wafer breakage, Uniformity, Uptime, Reliability, and Production-Proven technology. 

    Key Features:

    1.   Production-proven plasma etching system.
    2.   Up to 3%-5% Uniformity.
    3.   Frontside and backside isotropic and anisotropic etch.
    4.   Process Temperature: 6-65°C .
    5.   75mm-150mm wafer capability. 
    6.   Integrated solid robotic wafer handling. Single wafer process.
    7.   Fixed cassette station and wafer aligner/cooling station.
    8.   Can handle 50um thickness wafer.
    9.   PC controller with Advanced Allwin21 Software.
    10.   Endpoint detection with Allwin21 SLOPE technology. (Optional)
    11.   Up to 4 gas lines with MFC’s.
    12.   MKS 13.56 MHz RF Air-Cooled Generator 300W, 600W, or 1000W.
    13.   Pressure control with UPC. Throttle valve is optional.
    14.   Touch screen GUI.
    15.   EMO, Interlocks, and Watchdog function.
    16.   GEM/SECS II (Optional)
    17.   Small Footprint
    18.   Made in U.S.A.

     

    All Plasma Etch Equipment from Allwin21 Corp.

    Keywords:Plasma Etcher, Please Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Tegal 901e, Tegal 903e, Tegal 901e TTW, Tegal 915,Tegal 701,Tegal 703,Tegal 801,Tegal 803,Tegal 981e,Tegal 903e, Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Gasonics AE 2001, Microwave Etcher, Microwave Plasma Etcher, Microwave Etch, Downstream Plasma Etch


 Additional Info

New Exhibitor:
No
New Products:
Yes
Displaying Equipment:
Yes
Product Demonstrations:
Yes
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LED/solid state lighting, MEMS, Photovoltaic, Plastic/organic/flexible electronics, Power Semiconductors, Semiconductor, Test, Sub-systems/Components/Parts
If you checked Other, please indicate your Company Industry
Biomedical, Nanotechnology

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