Pall Corporation

25 Harbor Park Dr
Port Washington,  NY  11050-4605

United States
http://www.pall.com
  • Booth: 7509


Welcome to Semicon West 2017! Please stop by Booth 7509!

Pall Microelectronics is the global leader in filtration, separations and purification technologies for the microelectronics and photovoltaic industries. We support the semiconductor, data storage, fiber optic, advance display and materials markets with a comprehensive suite of contamination control solutions for chemical, gas, water, chemical mechanical polishing (CMP) and photolithography processes.

Stop by our booth to learn about our latest technologies for 10 nm processing and beyond!  You will also have a chance at winning a set of Bose Noise cancelling headphones!


 Press Releases

  • PORT WASHINGTON, NY, July 11, 2017 – Pall Corporation is pleased to introduce new filtration solutions for use in the semiconductor industry. Pall Corporation is a global leader in high-tech filtration, separation, and purification, serving the diverse needs of customers across the broad spectrum of life sciences and industry.

    Two new products will be featured in the Pall booth at the SEMICON West show this week. The solutions are designed to improve filtration and reduce defectivity in a variety of semiconductor applications.

    The New 1nm PE-Kleen Filter

    The 1 nm PE-Kleen filter is designed for dispensing advanced patterning materials used in semiconductor lithography processes.   The new filter rated at 1 nm is constructed of ultra-high purity, high density polyethylene materials.  It offers a 20% reduction in mean pore size, while maintaining the pressure drop of Pall’s existing 2 nm product.  This enables customers to move to tighter filtration without sacrificing pressure drop.

    “Pall’s PE-Kleen lithography filters are known for superior defect reduction capability,” said Michael Mesawich, Vice President of Strategic Marketing.  “The new 1nm PE-Kleen filter is a significant step in offering enhanced defectivity reduction.” The new 1 nm PE-Kleen adopts the Pall Xpress filter cleanliness option, designed for the most advanced patterning chemistries.   With the Xpress filter option, the 1 nm PE-Kleen filter is one of the cleanest lithography filters available.

    The New 2 nm Ultipleat® G2 SP DR Filter

    The new 2 nm Ultipleat G2 SP DR filter is the latest addition to Pall’s successful Ultipleat SP DR chemical filter line-up and is a key component of Pall’s disposable PFA Kleen-Change assemblies.  This filter is designed to meet the growing defectivity challenges of sub-10 nm critical aqueous chemical processing.  It demonstrates finer retention, high flow, and higher purity than previous filters.  Retention is validated using Pall’s gold nanoparticle challenge test.

    “The new Ultipleat G2 SP DR filter leverages Pall’s proprietary highly asymmetric membrane filter structure that removes contaminants as small as 2 nm, yet still maintains very high flow due to the unique membrane structure,” said Tony Shucosky, Vice President of Marketing, Pall Microelectronics. “Pall is proud to bring these important retention and high flow capabilities to the market to enable the semiconductor scaling cadence.” 

    Pall’s completely integrated manufacturing capability extends from polyarylsulfone resin to the finished filter device.  The company’s advanced manufacturing process uses clean room manufacturing and statistical process control to ensure the reliability and performance of every 2 nm Ultipleat G2 SP DR filter.

    ###

    For more information on these new solutions, visit Pall Corporation at SEMICON West, Booth #7509 or visit the Pall event page at https://microelectronics.pall.com/en/events/semicon-west-2017.com.

     
    About Pall Corporation

    Pall Corporation is a filtration, separation and purification leader providing solutions to meet the critical fluid management needs of customers across the broad spectrum of life sciences and industry. Pall works with customers to advance health, safety and environmentally responsible technologies. The Company’s engineered products enable process and product innovation and minimize emissions and waste. Pall Corporation serves customers worldwide. For more information, visit www.pall.com.

    Corporate Media Contact:
    Pall Corporation
    Mariann Kourafas
    Director, Communications
    (508) 871-5469


 Products

  • 2 nm Ultipleat® G2 SP DR Filter
    The new 2 nm rated Ultipleat® G2 SP DR filter is used for aqueous Wet Etch and Clean chemical applications....

  • Pall will showcase the new 2 nm rated Ultipleat® G2 SP DR filter for aqueous Wet Etch and Clean chemical applications. The latest addition to the popular Ultipleat SP DR filter family uses the proven HAPAS membrane.  While  tightening retention to an unprecendented 2 nm, the patented design maintains high flow performance for new 7 and 5 nanometer processes. Customer tests have validated up to 30 % reduction in on wafer particles > 19 nm in size compared to the baseline 5 nm filter.  The new 2 nm filter is available in several different cartridge and capsule configurations, including the Ultipleat® G2 SP DR KC Assemblies and the Ultipleat® SP DR SWD polyethylene capsule for POU applications on single wafer tools.

    Click on the following link to view the data sheet:  http://ow.ly/x1Z630d4bh9

  • 2nm/4KD Microza* OAT UF Module for UPW Filtration
    The new 2 nm/4KD Microza* OAT Ultrafiltration is designed to meet the growing defectivity challenges of sub-10 nm critical ultrapure water supply. It demonstrates finer retention and higher purity than previous ultrafiltration modules....

  • The new 2 nm/4KD Microza* OAT modules are recommended for todays most demanding ultra high purity water systems.
    - Latest high flow hollow fiber technology using a new asymetric support structure
    - Dual rated at 2 nm and 4000 Dalton
    - Dual skin cut off layer
    - OAT modules are shipped water wet using the new sanitized ultrapure water
    packaging process that provides:
    • Rapid rinse up for TOC, particles and
    metal ions
    • 4 weeks shelf life
    • >20nm particle rinse up control in UPW
    - Compatible with Microza OLT 6036
    dimensions

    For more product information, please click on the following link:  http://ow.ly/TnFe30d4d9Z

    *Microza is a TM of Asahi Kasei Corporation

  • 1 nm HDPE PE-Kleen Filters
    Pall Corporation presents its new 1 nm PE-Kleen filter designed for dispensing advanced pattering materials use in semiconductor lithography processes....

  • Pall Corporation presents its new 1 nm PE-Kleen filter designed for dispensing advanced pattering materials use in semiconductor lithography processes.

    The new filter rated at 1 nm is contructed of ultra-high purity, high density polyethylene materials.  It offers a 20% improvement in mean pore size reduction while maintaining pressure drop of our existing 2 nm product.  This enables customers to move to tighter filtration whithout sacrificing pressure drop.

    The new 1 nm PE-Kleen adopts the Pall Xpress filter cleanliness option, designed for the most advanced patterning chemistries.  With the Xpress filter option, the 1 nm PE-Kleen filter represents one of the the cleanest lithography filters available.  To learn more, please visit us at Semicon West, Booth 7509 in West Hall or at http://ow.ly/1DY630d4cC3.


 Additional Info

New Exhibitor:
No
New Products:
Yes
Displaying Equipment:
Yes
Product Demonstrations:
No

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