JEOL USA, Inc.

11 Dearborn Rd
Peabody,  MA  01960-3823

United States
http://www.jeolusa.com
  • Booth: 7111

SEM demo in booth, new E-beam tool, cross section perfection, and process gas analysis - join JEOL in booth #7111

JEOL is a leading supplier of high throughput, high resolution Scanning Electron Microscopes and Transmission Electron Microscopes (SEM/STEM/TEM), shaped beam e-beam mask making tools, direct write e-beam tools, EPMA and Auger instruments, FIB and cross section polishing tools, and NMR and high resolution Mass Spectrometers. Visit our booth to learn more about JEOL fast imaging and analytical SEM (bring your samples for an in-booth demo), and how our customers are using our powerful ARM200F S/TEM and now the 300kV ARM300F for atomic resolution imaging & chemical mapping. Explore gas analysis potential with the InfiTOF Mass Spectrometer. And learn how JEOL's 50 years of e-beam expertise has culminated in an all-new Direct Write E-Beam Lithography tool, the JBX-8100FS.


 Press Releases

  • July 10, 2017 (Peabody, Mass.) -- Since 1967, JEOL has been the industry leader in Electron Beam Lithography design and manufacturing. Now the company enters its 51st year in this field with the introduction of a new high throughput spot beam direct write system, the JBX-8100FS.

    This new generation of e-beam introduces the capability of writing ultrafine patterns at a high rate of speed directly onto substrates with minimum idle time during the exposure process. Maximum scanning speed has been increased to 125 MHz (the world’s highest level) for high speed writing applications.

    The JBX-8100FS features two exposure modes to support a range of patterning options, from ultra fine processing to faster throughput for small-to-mid-size production. The tool allows rapid development of integrated circuit patterns for prototypes or high volume manufacturing.

    Direct write electron beam lithography can be used to quickly write integrated circuit patterns with feature sizes guaranteed less than 10 nm onto a variety of substrate materials, and for superior pattern stitching of +/- 9nm or less in high throughput mode, or +/-20nm or less in high throughput mode. The high-precision stage accommodates substrates ranging from 200 mm diameter wafers down to small pieces.  

    The new system's small, compact footprint and low power consumption reduce cost of ownership. All JEOL e-beam systems are supported by the company's dedicated service engineers.

    Birck Nanotechnology Center, Purdue University, to be first US installation

    JEOL USA will install the first JBX-8100FS in North America at the Birck Nanotechnology Center, Purdue University, under the direction of Ali Shakouri and Dimitrios Peroulis. The interdisciplinary research center provides infrastructure for 160 affiliated faculty members and their research groups. The 186,000 sq ft. facility includes a 25,000 sq. ft. ISO Class 3-4-5 (Class 1-10-100) nanofabrication cleanroom.

    Learn more about the new JBX-8100FS.

  • Ultrahigh resolution Scanning Electron Microscope - we've just changed the rules of the game

    May 11, 2017 -- Peabody, MA JEOL USA introduces a new Scanning Electron Microscope (SEM) that combines the performance of a Field Emission SEM with the simplicity of the JEOL InTouchScope SEM series. The new JSM-IT300HR features exceptional image fidelity at any kV with a high brightness, long life emitter.

    Offering higher resolution and magnification than ever before in this series, the IT300HR greatly enhances surface topography and contrast.

    A rugged in-chamber specimen stage and large chamber accommodate a wide variety of samples of different shapes, sizes, and weights, enabling users to secure large, heavy and odd shaped objects on the stage with clear positioning prior to evacuating the chamber.

    The specimen chamber’s twelve geometrically-optimized analytical ports allow for multiple detectors, creating a virtual nano-lab inside the SEM. Low vacuum capability is a standard feature and allows for imaging and analysis of all types of samples in their native state.  When configured with a JEOL EDS detector, fast analysis is done directly within the  SEM software interface.

    InTouchScope™ series SEMs are designed to make operation intuitive, and controlled through touchscreen interface using multi-touch gestures and/or traditional keyboard/mouse and operation panel.  A ‘Navi’ mode guides operation from sample introduction to automatic condition setting for new or occasional users.

    "As a global leader in scanning electron microscopy for over 50 years, we’ve just changed the rules of the game," says Donna Guarrera, Asst. Director, SM Division, JEOL USA. "The JSM-IT300HR provides field emission performance on a very flexible but easy to use platform within a tungsten SEM’s price range. "

  • June 13, 2017, Peabody, Mass. -- The JEOL InfiTOF compact high-resolution gas analysis mass spectrometer is ideal for monitoring trace impurities in semiconductor process gases, evolved gases from catalytic reactions, vapor epitaxy and more.  No larger than a desktop PC, the InfiTOF instantly separates isobaric gases such CO and N2, or N2O and CO2, for continuous monitoring without chromatography. 

    This Time-of-Flight Mass Spectrometer uses Multi-turn and Perfect focusing technologies to achieve high mass-resolving power in a very compact package.

    Designed for real time monitoring of directly introduced gas, this high mass-resolution mass spectrometer features stability for real time gas monitoring and elemental composition determination through accurate mass measurement. 

    On July 11-13, the InfiTOF will be on display at Semicon West, where its applications to the analysis of gases used in semiconductor processing and vapor epitaxy and real-time monitoring of gases relevant to catalytic processes, battery technology and advanced materials will be highlighted.   http://bit.ly/2meqazL


 Products

  • JBX-8100FS Direct Write E-Beam Lithography System
    Writes ultrafine patterns at a high rate of speed directly onto substrates with minimum idle time. Maximum scanning speed has been increased to 125 MHz (the world’s highest level)....

  • This new generation of e-beam introduces the capability of writing ultrafine patterns at a high rate of speed directly onto substrates with minimum idle time during the exposure process. Maximum scanning speed has been increased to 125 MHz (the world’s highest level) for high speed writing applications.

    The JBX-8100FS features two exposure modes to support a range of patterning options, from ultra fine processing to faster throughput for small-to-mid-size production. The tool allows rapid development of integrated circuit patterns for prototypes or high volume manufacturing.

    Feature sizes guaranteed less than 10 nm onto a variety of substrate materials, and for superior pattern stitching of +/- 9nm or less in high throughput mode, or +/-20nm or less in high throughput mode. The high-precision stage accommodates substrates ranging from 200 mm diameter wafers down to small pieces.  

    The new system's small, compact footprint and low power consumption reduce cost of ownership. All JEOL e-beam systems are supported by the company's dedicated service engineers. 

  • IT100 InTouchScope Scanning Electron Microscope
    Fast data acquisition make imaging and analysis of samples a simple task....

  • The IT100 is a remarkably intuitive, high throughput microscope designed to streamline workflow in any lab. 

    With the IT100, it is simple to quickly obtain high quality images using both Secondary Electron and Backscatter Imaging. The embedded JEOL EDS system with silicon drift detector technology now includes Spectral Mapping, Multi-Point Analysis, Automatic Drift Compensation, Partial area, Line Scan, and Mapping Filter functions.

  • InfiTOF Gas Analysis Mass Spectrometer
    InfiTOF monitors trace impurities in semiconductor process gases, evolved gases from catalytic reactions, vapor epitaxy, and instantly separates isobaric gases for continuous monitoring without chromatography....

  • The InfiTOF compact high-resolution gas analysis mass spectrometer is ideal for monitoring trace impurities in semiconductor process gases, evolved gases from catalytic reactions, vapor epitaxy and more.  No larger than a desktop PC, the InfiTOF instantly separates isobaric gases such CO and N2, or N2O and CO2, for continuous monitoring without chromatography. This Time-of-Flight Mass Spectrometer uses Multi-turn and Perfect focusing technologies to achieve high mass-resolving power in a very compact package. Designed for real time monitoring of directly introduced gas, this high mass-resolution mass spectrometer features stability for real time gas monitoring and elemental composition determination through accurate mass measurement. http://bit.ly/2meqazL

 Additional Info

New Exhibitor:
No
New Products:
Yes
Displaying Equipment:
Yes
Product Demonstrations:
Yes

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