MASKER is a data preparation software package optimized for highest productivity and quality especially for masks in the application areas of photonics, displays, IoT and special devices. It extends todays technologies with many evolutionary developments that were adapted to these special applications over many years.
Fracturing is optimized especially for non-Manhattan/curved layouts resulting in minimal shape count that leads to highest throughput and improved quality.
Data volume is minimized for masks with highly repetitive structures, such as flat panel displays, by the utilization of a superior hierarchy engine. Optimal hierarchy enables efficient correction on cell level.
Resolution, CD uniformity & linearity for laser and e-beam mask writer systems is improved through a comprehensive Rule and Model Based MPC to correct for tool and process effects.
- Support for all major layout formats
- Support for major e-beam and laser mask exposure systems
- Superior fracturing of complex curved layouts
- Library of comprehensive layout processing functions optimized for hierarchical processing
- Integrated layout editor
- Built-in VIEWER for immediate inspection, verification, and measurement of patterns
- Rule Mask Process Correction (Rule-MPC) by rule-based biasing
- Model Mask Process Correction (Model-MPC) for laser and e-beam mask processes
- Verification, DRC and simulation features