Chemistries: Al2O3, SiO2, AZO, TiO2, GaN, TiN, Bi2O3, Pt, Co, Cu, Ta205, Hf203, MLD
Cost-effective, high-productivity ALD of many films and combination films including HfO2, ZrO2, Ta2O5, Al2O3, ZnO, ZnAlO, SiO2, HfSiO, TiO2, <300° TiN, BN, GaN, Nb3N5 and more.
Applications: Copper Barrier, ALD-Cap, Optical, Adhesion/Seeding, TCOs
Design: APOLLO uses our millisecond response ALD manifold that integrates 10 of our patented Fast Pneumatic Valves (FPV) to deliver over 100 million trouble-free cycles of composite and nanolaminate ALD films. This manifold is the only ALD manifold that can switch composition every cycle without any throughput penalty. Field proven since 2005, our valves set records for speed, reliability, lifetime and safety, while performing at temperatures as high as 220°C. Forge Nano’s ALD valves are the only doubly contained, spill-free UHP valves on the market.
Add Ons: Ozone Generator, QCM, Plasma