ROTARIS Universal Sputtering System

SINGULUS TECHNOLOGIES is a renowned manufacturer of advanced thin-film deposition equipment for MRAM, thin-film head, sensor and other semiconductor applications.

The flexible sputter deposition system ROTARIS is ideal for deposition of multilayers with a very high uniformity and a excellent thickness control. The ROTARIS is a bridge system for 200 mm and 300 mm wafer processing. Its main deposition chamber, the Rotating-Substrate-Module, can be equipped with up to 12 sputtering cathodes with a target diameter of 100 mm.

The ROTARIS design provides in particular a rotating substrate deposition technology with the additional capability to tilt the substrate. Additional features are “Co-sputtering” with up to four cathodes, DC-, pulsed DC-, RF-sputtering, wafer heating, and an in-situ aligning magnetic field. The installation of an ion source as alternative equipment allows for surface treatment and smoothing, ion milling and side wall cleaning.

Advantages

• High flexibility due up to 12 Targets in one deposition chamber
• High throughput for multilayer deposition with short change time between the materials
• Outstanding homogeneity
• Excellent Sub-Å thickness control with high repeatability
• Co-Sputtering opportunity with up to 4 cathodes
• Qualified processes for production
• Cost efficient solution

The TIMARIS cluster tool is dedicated for the deposition of ultra-thin metallic and insulating films down to a thickness of one nanometer and below and stacks of such films with very precise material thickness and high uniformity specifications. SINGULUS TECHNOLOGIES is a renowned manufacturer of advanced thin-film deposition equipment for MRAM, thin-film head, sensor and other semiconductor applications. It is the trusted partner in the respective industry and extends its leadership in the thin-film deposition technology for semiconductor applications. SINGULUS TECHNOLOGIES has already established and qualified the second generation of the TIMARIS PVD Cluster Tool platform in the market and is offering a complete portfolio of process modules for different applications.

As of today, more than ten process modules are available to configure a TIMARIS system according to customer needs. These modules include the Multi-Target-Module, Oxidation-Process-Module, Pre-Clean-Module, Combi-Process-Module, Four-Target-Module and Static-Deposition-Module as well as the Rotating-Substrate-Module. The Rotating-Substrate-Module is the core module of the ROTARIS platform, our sputtering system with a high flexibility including co-sputtering. The TIMARIS PVD modules incorporate the full scope of sputtering techniques as: DC magnetron sputtering, pulsed DC magnetron sputtering and RF magnetron sputtering as well as combinations of these modes are selectable by recipe.

Advantages

• Up to 10 Targets in one deposition chamber
• High throughput for multilayer deposition with short change time between the materials
• Outstanding homogeneity due to the patented Linear Dynamic Deposition (Patent US 7,799,179)
• Excellent Sub-Å thickness control with high repeatability
• Very long target life with optimised coating efficiency
• Low cost of ownership
• Qualified processes for production

Wet Process Systems for Semiconductor Applications

SINGULUS TECHNOLOGIES develops innovative technologies for efficient production processes. New production technology combined with sustainable processes and the use of novel materials can decouple the use of resources from economic growth in the long-term.

The SINGULUS TECHNOLOGIES product range starts with manual wet stations for R&D, semiautomated systems and up to fully automated tools for the chemical surface treatment like cleaning, etching and drying. They are able to handle all wet processes in the front-end and back-end production area.

SINGULUS TECHNOLOGIES also offers new process solution for the cleaning of metal-ceramic components. Metal-ceramic substrates made of silicon nitride have excellent thermal conductivity and excellent mechanical properties. The corresponding components are increasingly being used in high-performance electronics for the field of electromobility (hybrid and electric vehicles).

Features

• Up to 200 mm applications (double batch)
• High uptime
• Advanced process control
• Compact footprint – integrated switch boxes
• Upgradable by common and customized options
• Tier-1 components (Iwaki, GF, GEMÜ, SMC, Festo, Siemens)
• Platform executed for international industrial standards (CE, OSHA, UL)
• Complies with: FM 4910, SEMI S2 and S8, SECS (if requested)
• Third-party certification and US field labeling available
• Fast installation and start-up according by modular design

Range of products

• Manual wet process stations
• Semi- and fully automated wet process stations
• Quartztube- and part-cleaning stations
• Total metal free working stations
• Special customer specified units
• Chemical supply systems (pump or pressure systems)

The SINGULUS TECHNOLOGIES GENERIS PVD has been especially designed for very thin substrates. To generate and supply electric energy, thin-films of different electronic properties are deposited on the n-doped crystalline silicon wafer. SINGULUS TECHNOLOGIES has received an order for the delivery of an inline sputtering machine of the GENERIS PVD type from a company in Taiwan. The ordered machine is intended for the application of layers as part of transmission units in mobile communication technology.

SINGULUS TECHNOLOGIES has delivered more than 8000 vacuum coating machines worldwide. SINGULUS TECHNOLOGIES’ vacuum coating machines are installed at numerous customers all over the world and meet all of the key requirements of innovative coating technology in an ideal way. The GENERIS PVD ensures a high degree of uniformity of the layer thickness with layer reproducibility, high productivity and at the same time very low operating expenses.

The GENERIS PVD ideally meets the key requirements of the heterojunction cell technology with respect to sophisticated transparent conductive oxide layers (TCO) such as ITO (Indium Tin Oxide) and AZO (Aluminum doped Zinc Oxide). The solar cells are automatically transported through the process chambers of the GENERIS PVD, following the inline principle and applying coatings on both sides. The sputtering system safeguards a high level of layer thickness uniformity with high layer reproducibility, high productivity and at the same time very low operating expenses (OPEX).

The semiconductor division of SINGULUS TECHNOLOGIES  was awarded an order for a TIMARIS type cluster tool for vacuum deposition on 300 mm wafers. The order in a mid-single-digit range was placed by one of the largest semiconductor foundries of the world and is intended for mass production of integrated inductors.Integrated inductors enable highly-integrated voltage regulators. Thin-film transformers convert higher supply voltages to lower operating voltages directly in the chip/package. This has two primary benefits: The considerably smaller footprint allows higher integration in mobile devices. Datacenter benefit from reduced ohmic losses as transformation to higher current takes place at the consumer. SINGULUS TECHNOLOGIES thus enables further integration in the semiconductor industry and the reduction of energy consumption.

The vacuum deposition cluster tools of the TIMARIS type have modular design and can be equipped with various deposition and auxiliary modules. Amongst others, they include modules for sputtering, which can be equipped with several cathodes and operate in ultra-high vacuum of 10-9 Torr. Furthermore, they seamlessly integrate into the host system of modern, fully automated 300 mm fabs.