SONOSYS Ultraschallsysteme GmbH

Daimlerstrasse 6
Neuenbuerg, D-75305

Germany
http://www.sonosys.de

Booth: B1221

Happy to Welcome you at our Booth No. B1221 !

SONOSYS® is specialized in the development, manufacturing and distribution of highly sophisticated Ultrasonic/Megasonic Systems for single-wafer and batch processes, in the frequency range from 400 kHz to 5 MHz.

SONOSYS® Ultrasonic/Megasonic Systems provide highly efficient removal of particles down to the nano range from substrates with fragile surfaces, such as Wafers, Flat Panel Displays, Masks, Micro Systems or special parts within the LIGA-Technique.

SONOSYS® Ultrasonic/Megasonic Systems are available in a variety of materials and designs:
Megasonic Tanks, Transducer Plates, Submersible Transducers, Face-To-Face-Transducers, Megasonic Single / Dual Nozzle with a wide frequency range up to 5 MHz, Shower Nozzles, Atomizers and very compact and modular Ultrasonic and Megasonic Generators.

Our main markets:

• Semiconductor

• Micro/Nano Technology

• MEMS

• Hard Disc Drives

• Photovoltaics

• Optical Industry

• Food Industry

• Sonochemistry

• Research Institutes

Press Releases

News & Innovations (20210913)

Megasonics nozzles up to 5 MHz

SONOSYS® proudly presents highly effiecent contact-less cleaning with Megasonic nozzle systems. In a wide range of frequencies ranging from 600 kHz up to 5 MHz, even smallest structures can be cleaned reliably from nano particles without damaging fragile structures.

The transducer in the Megasonic nozzle generates a Megasonic wave, which is transmitted through a flowing liquid (e.g.: DI-water) to the surface of the substrate. With up to 35 W concentrated on a small point of only 4 mm results in superb results in contactless cleaning. The dual nozzle works with two distinct frequencies and provides removal of a wider range of particles.

Applications:

Cleaning of single wafers, masks, LCDs, substrates and micro electro mechanical systems (MEMS). The 600 kHz system is used in the optics and medical industries to remove larger particles.

Products

Submersible Transducers

The SONOSYS® submersible transducers can be used with any vessel and medium and offer maximum flexibility. Made of stainless steel of PVDF in different sizes and with different frequencies they fit many applications and set-ups.... More Info Less Info

Submersible Transducers

400 kHz / 600 kHz / 1 MHz / 2 MHz

The SONOSYS® submersible transducers can be used with any vessel and medium and offer maximum flexibility. Made of stainless steel of PVDF in different sizes (4”, 6” or 8”) and with different frequencies (at power up to 2000 W) they fit many applications and set-ups, particularly in experiments and in the lab.

Submersible transducers are mainly used in

Cleaning of substrates
Semiconductor wafers
Micro parts and systems, MEMS sensors
Photoresist removal within the LIGA technology
Support of etching processes

Single and dual nozzles

The Megasonic single and dual shower nozzles (600kHz to 5 MHz) transmits the sonic wave into the flowing water and its surface. With up to 35 W concentrated on a small point of only 4 mm results in superb results in contactless cleaning. ... More Info Less Info

Single Nozzle

600 kHz / 1 MHz / 2 MHz / 3 MHz / 4 MHz / 5 MHz

The Megasonic single shower nozzle transmits the sonic wave into the flowing water and its surface. Thereby the power of up to 35 W is concentrated on a small point of only 4 mm which results in superb results in contactless cleaning.

Dual Nozzle

1 MHz + 2 MHz / 1 MHz + 3 MHz / 2 MHz + 3 MHz / 2 MHz + 4 MHz / 3 MHz + 5 MHz

The Megasonic dual nozzle works like the single nozzle but with two distinct frequencies. Therefore, a wider range of particles can be removed by using only one nozzle system with two outputs.

The single and dual nozzles are used in cleaning of single wafers, masks, LCD panels and substrates.

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