ECI Technology Inc.

Totowa,  NJ 
United States
http://www.ecitechnology.com
  • Booth: 5451

关于ECI科技公司

成立于1987, ECI科技公司是化学品管理系统在半导体, PCB 和 先进封装行业的全球领先供应商。该公司致力于化学品量测的创新,使客户能够更好地控制及监控他们的生产和研发过程。 ECI科技公司不仅在全球拥有广泛的业务和技术支援服务,同时在中国,台湾,韩国和日本也已成立分公司。欲了解更多信息,请访问http://www.ecitechnology.com。

About ECI Technology, Inc.

Founded in 1987, ECI Technology, Inc. is a leading global supplier of chemical management systems for the semiconductor, PCB, and advanced packaging industry. The company is driving chemical metrology innovations, empowering customers to monitor and control their manufacturing and research. ECI Technology, Inc. has a worldwide representation and service support, including offices in China, Taiwan, Korea and Japan. For more information, visit http://www.ecitechnology.com. 


 Products

  • QUALI-LINE PRIMA
    Advanced on-Line Chemical Management System for Interconnects and Damascene Processes 精确和可靠电镀铜药液分析在整个半导体制程工艺中扮演着非常关键的角色。ECI 拥有20多年在线电镀铜制程工艺分析经验,从初期到现今最新7nm/5nm,ECI QUALI-LINE 在线电镀铜化学监测系统一直是半导体行业唯一被受信赖和使用。...

  • QUALI-LINE PRIMA是下一代QUALI-LINE化学监测系统,具有最新的硬件和软件以及增强的性能,可靠性和功能。

    Copper Damascene processes are critical for fabrication of Interconnects in Semiconductor applications. The Semiconductor industry is challenged by cost and yield improvements. Precise and reliable on-line metrology of Cu processes is required for successful and efficient production as feature sizes of interconnects continue to reduce in dimensions for competitive scaling.

    For 20+ years, ECI's QUALI-LINE®Chemical monitoring systems have been the industry standard for Analysis and Control of Copper Damascene Processes. QUALI-LINE PRIMA is the next generation of QUALI-LINE Chemical monitoring system with latest hardware and software and enhanced performance, reliability and features.

    New Features includes

    • Automatic Standard Generator (ASG), self-calibration and validation
    • Bath Health Monitor analysis for by-product, contamination and yield monitoring and control
    • Analyzer Health Monitor (AHM) for predictive maintenance

    Please visit ECI booth # 5451 if you would like to learn more.......See you soon

  • QUALI-FILL LIBRA
    Online chemical metrology and intelligent dosing system for electroplating or electroless packaging applications, targeting needs of advanced packaging with superior analytical performance and reduced cost. 在线化学测量和智能添加系统给电或无电镀封装应用,以卓越分析性能和低成本为目标,满足先进封装需求。...

  • ECI为先进晶圆级封装制造业 提供化学分析解决方案.

    Quali-Fill LIBRA 系列系统分析功能包括Copper Pillar, RDL, Bumping 和 UBM 制程溶液。 Quali-Fill LIBRA系列系统采用了最新的模组化设计,不但能够同时支援多个化学槽,如Cu(铜)、SnAg(锡银)、Sn(锡)、Ni(镍)和Au(金),还能根据需要扩充或新增单元或其他化学药液分析。除了既有的化学分析,Quali-Fill LIBRA系列系统还可以添加有机分解物和光刻胶以及污染物分析功能。 Quali-Fill LIBRA系列系统搭配智能型化学成分计量添加功能,以高精度计量和闭回路控制,为先进晶圆级封装制造业提供了一个高效益和高良率的解决方案。

    Features 特征

    • Supports all major chemistries 
    • Seamless integration with plating tool 
    • Smallest footprint and modular design 
    • Complete solution with intelligent dosing and precision control 
    • Automatic standard generation (ASG), validation and calibration 
    • Analyzer Health Monitor (AHM) for predictive maintenance 
    • Bath Health Monitor (BHM) for yield improvement 
    • ○ By-products analyses
    • ○ PR/contamination monitoring and control
    • Analytical techniques are integrated based on CoO and desired specs 

    • 支持所有主要的化学,包括Electroless, Electroplating, and Etch/Clean
    • 模组化设计,方便未来扩充或新增单元
    • 最小占地面积和最灵活模块化设计
    • 智能添加精确控制全套解决方案
    • 全自动化,包括自动标准液生成和验证以及预测性维护
    • 外加添加有机分解物和光刻胶以及污染物分析功能


    Wide Range of Analytical Techniques
    NIR Spectroscopy • UV-Vis Spectroscopy • Potentiometric Titration •
    Surface Tension • Conductometric Titration • Specific Gravity •
    E-Chem Impedance • OCP (Open Circuit Potentiometry) • Stripping •
    Dissolved Oxygen • HPLC • ICP • And Others!


    Processes

    • Electroplating
    • ○ Cu TSV, Cu RDL, Cu Pillars, Ni, SnAg, Sn, Au
    • Electroless
    • ○ Cu, Ni, Pd, Au, Permanganate Etch, Persulfate Etch,
    • Activator and supporting processes
  • QualiLab QL-EZ
    The most reliable, robust, and compact solution for quantitative analysis of component concentrations in every known plating solution used by PCB factories, Semiconductor fabs, and R&D labs....

  • Features

    • Proprietary CVS techniques for analyzing organic bath components
    • Potentionmetric titration for analyzing inorganic components
    • Spectroscopy using corrosion-resistant UV-Vis cuvette holder
    • RDT analytical technique for Nickel
    • Analysis of breakdown products and contaminants
    • Best accuracy and reproducibility on the market
    • The largest applications library in the industry
    • Automatic syringe delivery system
    • 15 position turntable and 14 position sample holder
    • CVS II head offers greater rotation speed for analyzing novel chemistries
    • User-friendly software
    • Advanced reporting and data handling including statistics, trend analysis and history management
    • State of the art hardware and OS for faster operation and low power consumption
    • Communication: TCP/IP networking, LIMS

    Typical Applications

    Electroplating
    Organic additives and inorganic components in baths for Cu, Ni, Au, Sn, SnAg, Sn/Pb, Pd, Zn, Co/Ni

    Electroless
    Metals, reducing agents, complexing agents, buffering agents, background ions in electroless deposition for Co, Cu, Ni, Au, Pd and related auxiliary solutions

  • QUALISURF
    QUALISURF addresses the need for tight monitoring and control of chemical concentrations and ratios in multiple-component chemistries used for Clean and Etch processes. QUALISURF 解决了对用于半导体化学药液清洗和湿法工艺的多组分化学品中的化学浓度和比率进行严密监控的需求...

  • 化学药液浓度在线检测 
    多组分化学药液,组分例如 H2O2,pH, 缓蚀剂,氟化氢,混酸或单酸等药液监测。
    经验证,更精准在线实时分析。ECI 根据药水和工艺需求,设计和结合不同分析方法,包括滴定, 光谱, CVS, HPLC, ICP和ECI专有分析方法,为半导体清洗和湿法工艺提供更精准在线实时监控。

    Features and Benefits 特点和优点

    • Reporting individual concentrations of multiple-component chemistries 
    • Superior accuracy and precision 
    • Etch rate monitoring capability 
    • Multi-channel capable of controlling several tanks 
    • Real-time analysis, continuous monitoring 
    • In-line optics probe for incorporation with existing wet process equipment 
    • Feedback signals for automatic closed-loop control of process equipment 
    • Minimal PM requirements 

    • 精准在线实时分析
    • 监控多组分化学药液
    • 连续监测个成分浓度
    • 刻蚀速率监控能力
    • 与现有半导体工艺设备相结合的在线光学探头
    • 工艺设备自动闭环控制和连接

    Typical Applications

    • Supports SC1, SC2, SPM, BOE, DHF, DSP+, KOH/IPA, HF/HNO3, TMAH, PAN, H3PO4 and many more.
    • Monitoring consistencies of wet processing/surface preparation solutions as chemicals age
    • Controlling point-of-use fresh chemical mixtures
    • QUALISURF can be used to predict thin film etch rates of solutions - with extensive fab-proven results
    • In-line monitoring of particle density in CMP slurries
  • QUALI-LINE QUANTA
    ECI’s state-of-the-art analyzer designed to monitor Cobalt electroplating solutions efficiently with the highest accuracy and reproducibility....

  • Features

    • Support for all commercial chemistries/formulations
    • Automatic validation and calibration
    • Seamless integration with plating tools
    • Effective and reliable delivery system
    • Small footprint: 30" x 24" x 68"
    • Safety standards: S2/S8, CE
    • NOWPak® reagent delivery system
    • Automated Standard Generator (ASG)
    • Ultra-low CoO