The 300mm LPCVD (Low Pressure Chemical Vapor Deposition) system deposits thin film including Doped Poly Si, LPTEOS, Nitride, and MTO which is the core process for semiconductors using a chemical reaction in a low pressure state.
LPCVD is applied to several tens of nm semiconductor manufacturing process. Moreover, it needs increased thin film uniformity and step coverage as design rules become more rigid. Our company satisfies these specifications by our unique chamber structure and gas supply system.
And high-end equipment has excellent competitiveness which is provided by suppressing the occurrence of particles due to by-products generated through a chemical reaction, and by obtaining our company’s own design technology to prevent contamination, various mass production experiences and know-how, because of the characteristics of deposition equipment. Due to our design capability and experience, our high end equipment has excellent competitiveness by minimizing particles from by-products generated through chemical reactions which also prevent contamination.