Excellent ramp-up and ramp-down rates and
high vacuum capable
High precision VPO-1000-300 for several applications like RTA (annealing for silicon and compound semiconductor wafers), (RTO) rapid thermal oxidation, (RTN) rapid thermal nitridation, rapid thermal diffusion from spin-on dopant, crystallization, contact alloying and more.
The systems are equipped with a 7” touch panel which allows easy and comfortable programming directly on the unit. 50 programs with 50 steps each can be stored.
The software allows the permanent monitoring, read-out and analysis of temperature, process gas flow, cooling water level status pressure value and status. Data logging in .csv format is default.
The max. temperature is up to 1000 °C . Key features are precisely controlled fast ramp-up (up to 40 K/sec) and ramp-down rates (up to 200 K/min). External water cooling is required.
The system is vacuum capable up to 10-6 hPa (as option). A membrane/ diaphragm pump, a chemically resistant pump and a rotary vane pump are available as accessories.