NISHIMURA CHEMITECH CO.,LTD

Osaka,  Osaka 
Japan
http://www.nishimura-ct.co.jp
  • Booth: T2373


We sincerely invite you to visit our latest products!

   Nishimura Chemitech started business in 1968 as a trading company in the surface treatment field. To adapt to changing social needs, we are expanding the business field as a general trading company in the high-tech industry that deals with semiconductors and electronic devices (FPD/PCB) covering all areas of Japan. In the overseas market, we pioneered opening business bases for the Southeast Asian network in Singapore and Taiwan and are also promoting our business there.
   Semiconductors and electronic devices are essential for the IT society. We believe that we have established a partnership with customers by offering superior, cutting-edge products and technologies. However much the times may change and the business style may evolve, it is our basic philosophy to offer products and technologies that satisfy our customers. We discover customer needs through careful sales and service activities, fulfill our corporate social responsibility under the slogan, "Customer satisfaction first and foremost," which has been inherited since our foundation, and move forward aiming for sound corporate management and harmonious coexistence with the environment.


 Products

  • Forefront Mix and Supply System (Slurry)
    This device mixes and supplies slurry stock solution and DIW (+ additives, etc.) just prior to CMP equipment. It is capable of supplying Pure Slurry with no need to worry about expiration limits, deterioration, etc....

  • In order to reduce the installation area, we have achieved mixing unit-less system that stores its functional parts under a single sheet of grating floor panel.

    ◎Elimination of the mixing device expands the effective area within the clean room. (Achieve Forefront Mixing Unit Size: 600mm×600mm)

    ◎Reduces stand-by stress of slurry solutions by mixing just prior to supply.

    ◎ Enables the same slurry concentration to be adjusted at each use point.

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