Nissan Chemical Corporation

Chuo-ku,  TOKYO 
Japan
http://www.nissanchem.co.jp/
  • Booth: 2531

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BARC is bottm anti-reflective coating developed for semiconductor lithography. It solves various problems with exposure by coating under photo resist products. They are effective in preventing problems caused by reflection of light from the substrate. Nissan Chemical Industries, Ltd. is in conjunction with Brewer Science, Inc. has developed many BARC for i-line, KrF, ArF and Dual Damascene to satisfy all customers' requirements

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