Precision Polymer Engineering Ltd.

United Kingdom
  • Booth: 3138

Welcome to Precision Polymer Engineering at SEMICON China!

Precision Polymer Engineering (PPE) manufactures innovative seals, O-rings, slit valve doors, wafer handling components and custom parts - delivering sealing solutions able to perform to the highest standards in aggressive semiconductor production environments.

At SEMICON China 2019 we'll be unveiling Perlast Helios, our brand new high temperature elastomer material range.

Using the latest polymer technology, PPE seals are designed to provide excellent mechanical properties with extended high temperature performance, outstanding chemical and plasma resistance. Our ultra-pure organic elastomer grades do not contain carbon or metal fillers, reducing particle generation and minimising contamination. 

PPE will be showcasing its range of cost effective elastomer materials at Semicon China, with each of our material families engineered to reduce the cost of consumables by whilst maintaining excellent levels of sealing performance.

See our latest materials at #3138, and put your questions to our semicon sealing experts!

 Press Releases

  • Precision Polymer Engineering (PPE) has released Perlast® Helios G7HA, an FFKM sealing material for semiconductor applications proven to combine plasma resistance with high temperature sealing performance.

    Precision Polymer Engineering (PPE), manufacturers of high-performance sealing technology headquartered in Blackburn, U.K., has launched Perlast® Helios G7HA as a new material for the critical semiconductor market. In extensive testing, Perlast® Helios G7HA demonstrated excellent sealing performance at temperatures exceeding 300°C. The new PPE material grade also outperformed competitor materials against aggressive plasmas, including high concentrations of fluorine radical plasmas.

    “Perlast® Helios G7HA is a step change in semiconductor equipment sealing,” said Christian Thevot, Product Manager for Semiconductor at PPE.

    “This new material has been developed in line with what our customers have been asking for – a fully organic FFKM which delivers purity with plasma resistance in high temperatures. We’re delighted with the results from laboratory testing and customer trials. We’re confident that G7HA will play a key role in cutting equipment downtime and reducing overall cost of ownership across a wide range of semiconductor applications.”

    Outperforms in harsh plasma environments

    Perlast® Helios G7HA has been tested extensively in a series of plasma environments (RPS NF3, RIE NF3, CCP NH3, RIE SF6, RIE O2 and CCP O2). In each environment, the new G7HA grade demonstrates a significantly lower plasma erosion rate than leading competitors – and 27% lower in NF3.

    Lower trace metals than other FFKM seals

    Perlast® Helios G7HA is a fully organic material grade, with analysis showing extremely low trace metal levels and low particle generation when measured against comparable FFKM and FKM sealing materials. Low trace metals and low particle generation are key to reducing process contamination, significantly increasing yield and reducing operational downtime.

    G7HA removes trade-off between purity and performance

    Previously in the semiconductor sealing market, choices had to be made between seal purity and high performance in a sealing system – and particularly so with purity versus plasma resistance. Perlast® Helios G7HA is one of the first elastomer innovations to give reliable results across both purity and resistance to aggressive plasmas and chemical media.

    Perlast® Helios G7HA has been developed for use in wet and dry semiconductor processes, including etching, stripping and cleaning. The new material is expected to be moulded into dynamic and static sealing products, including isolation valves, chamber O-rings and gas inlet seals.

    Key attributes of Perlast® Helios G7HA

    • Excellent plasma resistance
    • Excellent chemical resistance
    • Excellent high temperature sealing performance
    • Exceptionally low trace metal content
    • Very low particle generation
    • Low out-gassing properties, making it ideal for vacuum applications

    Perlast® Helios G7HA is the latest material grade to join the Perlast® family of perfluoroelastomer (FFKM) elastomers. Perfluoroelastomer is the most chemically resistant elastomer available, and is effectively a rubber form of PTFE. Perlast® seals are used in critical sealing applications where purity and performance are paramount.

    Precision Polymer Engineering will be showcasing Perlast® Helios G7HA at SEMICON West in San Francisco, between 9-11 July (Booth #1061).


    Contact for information, further quotes or interview:

    Christian Thevot – Product Manager (Semiconductor), Precision Polymer Engineering


    Tel: +33 (0) 610865602

    Notes to Editor:

    About Precision Polymer Engineering

    Precision Polymer Engineering Ltd (PPE) is a leading provider of high performance O-rings, technical rubber mouldings and sealing solutions to a diverse range of industries across the world.

    Founded in 1975, with its head office in Blackburn, England, PPE operates manufacturing facilities in the UK and the US, plus sales offices and dealers across the US, Europe and Asia. The company’s success is based on the continual development of new elastomer materials combined with exceptional levels of customer service and technical support.

    About IDEX Sealing Solutions

    Precision Polymer Engineering (PPE) is a member of IDEX Sealing Solutions – an applied solutions provider serving niche markets worldwide. IDEX is a leader in creating and enabling technology and improving business prospects for a diverse customer set across the globe.


  • Perlast Helios
    Perlast Helios (G7HA) is a new perfluoroelastomer grade which has been specifically designed for high temperature applications in semiconductor processes....

  • Perlast Helios (G7HA) is a new perfluoroelastomer grade which has been specifically designed for high temperature applications in semiconductor processes.

    Perlast Helios (G7HA) offers outstanding sealing performance over 300°C, and has excellent overall plasma resistance – especially against high concentrations of fluorine radical plasmas. This grade ensures no trade-off between high temperature performance and high purity, with a fully organic formulation offering extremely low trace metal levels for higher yields and reduced process contamination.

    Perlast Helios (G7HA) combines outstanding long term mechanical performance, excellent plasma resistance and ultra-high purity, which can help to significantly reduce operational downtime and cost of ownership.

    Key Attributes

    • Excellent high temperature sealing performance
    • Excellent plasma resistance
    • Excellent chemical resistance
    • Low out-gassing properties, making it ideal for vacuum applications
    • Ultra-low trace metal content
    • Very low particle generation

    Typical Applications

    Developed for use in various semiconductor applications. Suitable for use in wet and dry semiconductor processes including:

    • Etching
    • Stripping
    • Cleaning
    • PVD
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