Blankmask is an indispensable material for photomask that is essential for manufacturing of semiconductor, TFT-LCD, color filter and etc. which are the chief items of export and means former state of building up pattern for photomask and consisted of metal layer and resist film on glass substrate.
Photomask is a process of forming pattern with e-Beam or optic equipment on blankmask and each pattern can divide into transparent and opaque area, so it can make selective transmission for the incident light.
Blankmask's metal layer consists of light blocking layer and AR(Anti-refective) layer. Light shield layer can be made regular thin film using with metal target usually chrome. Also, AR layer can be made by mixing argon gas and reactive gas with Cr target.
Blankmask manufacturing is finished with e-Beam resist or optic resist coating on deposited metal layer.