Beijing Yuji Science and Technology Co.,Ltd.

北京,  北京市 
China
http://www.beijingyuji.com
  • Booth: 7464

Beijing Yuji Science & Technology Co., Ltd. (Yuji Tech), headquartered in Beijing, China, was founded in 2005. Yuji Tech is a high-tech enterprise jointly founded by famous scholars and experts at home and abroad. Our core business covers fluorine chemical, LED phosphor and LED package.

In fluorine chemical, Yuji Tech has been dedicated to R&D of production of ODS alternatives, fluoropolymers and fluorinated fine chemicals for years, and has become an international leading innovation enterprise in fluorine chemical research and production. Yuji Tech has undertaken the projects of Development and Industrialization of ODS Alternatives from Ministry of Environmental Protection and Development and Industrialization of ODS Alternatives from the Industry and Information Technology Department of Shaanxi Province. In 2014, the project Development and Application of the Manufacturing and Catalytic Technology of Zero ODP and Environmentally Friendly Fluorides by Yuji Tech won the second prize of Beijing Science and Technology Award. In 2016, Yuji Tech won the first prize of "Shaanxi Provincial Science and Technology Award". In 2017, Yuji Tech won the second prize of “State Science and Technology Invention Award”. At present, Yuji Tech has applied for 62 invention patents, of which 20 have been granted. Yuji Tech's main fluorine chemicals cover refrigerants, blowing agents, aerosol propellants, fire extinguishing agents, cleaning agents, electronic gases, Insulating gases, isocyanates, perfluoroalky iodides, fluorinated intermediates, fluoropolymers, etc.

 Products

  • Dry etching gases
    The main electronic special gases from Beijing YUJI are new types of dry etching gases, such as Hexafluoro-1,3-butadiene C4F6, Methyl Fluoride CH3F, Trifluoroiodomethane CF3I, C4H2F6 HFO-1336mzz (E), C3H2F6 HFC-236fa & HFC-236ea, C3H3F5 HFC-245fa, etc....

    • Hexafluoro-1,3-butadiene (C4F6) is an environmentally friendly dry etching gas with low GWP, high etching rate, high selectivity and high aspect ratio, showing very high performance for critical plasma etching in semiconductor devices manufacturing.

    Methyl Fluoride (CH3F) is an environmentally friendly dry etching gas with low GWP, showing very high performance in etching process of semiconductor and electronic products.

    Iodotrifluoromethane (CF3I) is an environmentally friendly dry etching gas with low GWP，mainly used in front end etching process of flash memory chips manufacturing.

    HFO-1336mzz(E) is a non-ozone depletion, non-flammable, low global warming potential (GWP) environmentally friendly and novel dry etching gas, mainly used in front end etching process of semiconductor.

Categories

301 Materials, Chemicals & Solids
  • Cleaning Chemicals; Solvents; Strippers
  • Other Specialty Chemicals
    • 303 Materials, Gases
  • Etchant Gases
  • Other Specialty; Mixed Gas
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