SONOSYS Ultraschallsysteme GmbH

  • Booth: 2681

We are looking forward to meet you!

SONOSYS® offers solutions in the field of ultrasonic and megasonic cleaning for various applications. The focus hereby is on higher frequencies (between 400 kHz and 5 MHz) for cleaning the smallest particles and contaminants, right down to the nanometer range.

The megasonic products are developed entirely in-house, and range from the generator and transducer plates with patented piezo ceramics up to submersible transducers and single and dual nozzles. After its founding in 1995 the R&D and production was scaled up continuously to a wide product portfolio and to become a European leader in Megasonics technology.

The solutions comply to the strictest quality and reliability requirements of the semiconductor, MEMS and LIGA technology industries. The central focus here is always customer requirements and satisfaction. True to the company's motto, "Mastering nanoClean together", customer interests are analyzed and optimized together to achieve the best cleaning results.

 Press Releases

  • When it comes to small and smallest particles on surfaces, the use of Megasonic is known for years (i.e. ultrasonic waves in the higher frequency range, usually 400kHz upwards). Most notably, if particles smaller 1 micron shall be removed, the method is quite successful. Thereby, it doesn’t damage the sensitive micro- and nanostructures of the substrate, since the cavitation bubbles are much smaller than with traditional ultrasound. Typical applications are wafer cleaning, MEMS and microstructure cleaning and etching, removal of photoresist in photo masks and many others.

    The latest trends with this technology look at even higher frequencies, that is more than currently 5 MHz for even smoother cleaning and the control systems become more advanced. With future generations it will be possible to digitally control the nozzles, allowing for a wide control range and very short cycles of on/off times.

    Nowadays nozzles are available in a single or dual versions, meaning, that either one frequency – e.g. 1MHz – or a combination of two frequencies – e.g. 1+3 MHz – is applied. The fully metal-free design with a housing made of PTFE (Polytetrafluoroethylene ) allows to meet the high requirements in the semiconductor industry. The medium passes by at the internal piezo ceramic which modulates the high frequency ultrasound into the water stream and is finally focused by a quartz glass nozzle outlet with a width of approx. 4mm, resulting in a Megasonic jet stream to effectively cleaning your surface.

    This way, for example a 200mm/8” Si-wafer can be cleaned within 1 minute from silicon nitrite (Si3N4) and silicon dioxide (SiO2) particles, depending on cleaning media and temperature up to a PRE of >= 98%.

    Any question? – Reach out to us at [email protected] or [email protected] for assistance in mainland China.

    SONOSYS Ultraschallsysteme GmbH
    Daimlerstrasse 6
    75305 Neuenbürg


    Tel.: +49-7082-79184-0
    [email protected]

    --- Excellence in ultrasonic and megasonic since 1995 ---


  • Single and dual nozzles
    The Megasonic single and dual nozzles (600kHz to 5 MHz) transmits the sonic wave into the flowing water and its surface for effective but damage-free cleaning....

  • SONOSYS®超声波/兆声波系统提供高效率去除小至纳米级存在于基材, 半导体硅晶圆, 平面显示屏, 掩模, 微系统及LIGA上的颗粒.

    既有产品: 发振板, 浸泡式发振器, 面向式发振器, 单喷头/双喷头 兆声波发振器, 帘幕式发振器,兆声波雾化器, 及小型模块化最高至2000瓦的兆声波发振源


    兆声波单喷头与双喷头 (600千赫~5兆赫可选)可将声波传送至流体及其表面, 藉由最高35瓦的功率输出, 集中于仅4毫米直径的点, 进行非接触式的高效清洗, 双喷头可搭载两种不同频率进行颗粒大小范围较广的颗粒去除.

  • Submersible Transducers - 沉入式发振器
    400 kHz / 600 kHz / 1 MHz / 2 MHz SONOSYS® submersible transducers for Megasonic cleaning...

  • SONOSYS®超声波/兆声波系统提供高效率去除小至纳米级存在于基材, 半导体硅晶圆, 平面显示屏, 掩模, 微系统及LIGA上的颗粒.

    既有产品: 发振板, 浸泡式发振器, 面向式发振器, 单喷头/双喷头 兆声波发振器, 帘幕式发振器,兆声波雾化器, 及小型模块化最高至2000瓦的兆声波发振源


    400千赫~ 2兆赫

    SONOSYS®沉入式发振器可使用于各种容器与介质并具有最大的使用弹性, 不锈钢本体披覆PVDF抗化性, 可做成4", 6", 8" 晶圆大小的有效面积, 适应不同频率及最高输出功率至2000瓦以满足多种应用及架构.

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