Seiwa Optical (Shanghai) Co.,Ltd.

  • Booth: 1822

Equipment and Optical for C-MOS Power device,LED,MEMS

With 57 years of excellent experience on Optical technology, we manufacture various kinds of equipments including Double-sided Exposure System, Double-sided Pattern Inspection System,,Spin Coater& developer(Track), Multi Layer Thickness Inspection System, Nano Inprint, Photovoltaic cell Inspection System *Exposure System* Double-sided Exposure System for f300 Foup(Alignment accuracy; less than ±1µm, through put; 100 plates/H),Double-sided Exposure System for LED(through put; more than 150 plates/H),Manual Exposure System for Development, Double-sided Exposure, Film Exposure, Touch Panel Exposure(Double-Sided Pattern Alignment Inspection System).both sides alignment inspection accuracy ; less than 20nm,(CMOS, Power Device, Crystal, Ink jet, and etc)

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