Shanghai Jheat Technology Co., Ltd.

产品概述Overview 

Wafer晶圆无线测温系统可捕捉晶圆刻蚀工艺、环境对晶圆的影响,可在芯片制造的每个关键步骤中提供直接、实时的晶圆温度测量。借助这些全面的温度数据，工艺工程师可以表征和微调工艺条件，从而提高工艺设备性能、晶圆质量和产量。Wafer晶圆无线测温系统用于监测尖端产品生产工艺流程中温度变化情况，突破了技术封锁。

Wafer wireless temperature measurement system captures the influence of etching process and environment on wafer, provides direct and real-time temperature measurement during every critical step in chip manufacturing. Armed with this comprehensive temperature data, technology engineers will be able to characterize and fine-tune process conditions to improve technology and equipment performance, wafer quality and yield. Wafer wireless temperature measurement system is used to monitor temperature changes in the production process of cutting-edge products, breaking through the technical blockade.

产品特点Features

1.  精度高，应用灵活，采样速度快；

2. 扫描速度可达10Hz，温度准确度高达1mK；

3. 采用无线通讯方式，可连续工作时间不超过60分钟。

1. High accuracy, flexible application, fast measurement;

2. Scanning speed up to 10Hz, temperature accuracy up to 1mK;

3. Wireless communication, continuous working time not exceeding 60 minutes.

产品参数Parameters 

产品概述Overview

Wafer晶圆有线测温系统用于监测尖端产品生产工艺流程中温度变化情况，可捕捉晶圆刻蚀工艺、环境对晶圆的影响,可在芯片制造的每个关键步骤中提供直接、实时的晶圆温度测量。

Wafer wired temperature measurement system is used to monitor temperature changes in the production process of cutting-edge products. It captures the influence of etching process and environment on wafer, provides direct and real-time temperature measurement during every critical step in chip manufacturing. 

产品特点Features

1. 精度高，应用灵活，采样速度快；

2. 扫描速度可达10Hz，温度准确度高达1mK；

3. 采用有线通讯方式。

1. High accuracy, flexible application, fast measurement;

2. Scanning speed up to 10Hz, temperature accuracy up to 1mK;

3. Wired communication.

产品参数Parameters 

产品概述Overview 

传统的辐射校准光源，如氘灯、石英窗卤素钨灯、长弧氙灯等无法在200 nm-800 nm范围内保持较高的输出，在光谱测量范围上都具有非常大的局限性。宽光谱光源采用光致发光原理，利用激光驱动气体等离子体发光，实现激光驱动。该光源可以在 170 nm 至 2100nm 的光谱范围内提供超高发光亮度，而且整个光源的发光寿命相比较于传统光源也高出了整整一个数量级。

Traditional radiation calibration light sources, such as deuterium lamps, quartz tungsten-halogen lamps, long-arc xenon lamps, etc. cannot maintain a high brightness output in the range of 200 nm-800 nm, and have very large limitations in the spectral measurement range. The broadband light source adopts the photoluminescence principle of laser-driven gas plasma light emission. It provides ultra-high luminous brightness in the spectral range from 170 nm to 2100 nm, and its service life is an order of magnitude longer than conventional light sources.

产品特点Features 

1. 可实现100μm量级发光等离子体，在170 nm-2100 nm波长范围内具有超高亮度；

2. 超快速测量，光谱辐射亮度>10mW/nm/mm²/sr；

3. 超长寿命、超高稳定性、超低成本、光学灵活性高。

1. It has ultra-high brightness in the wavelength range of 170 nm-2100 nm with 100 μm luminous plasma;

2. Ultra-fast measurement, spectral radiance >10mW/nm/mm²/sr;

3. Ultra-long life, ultra-high stability, ultra-low cost, high optical flexibility.

产品应用Applications

紫外-可见光光谱分析

UV-Vis Spectral Analysis

单色仪光源

Monochromator Light Source

薄膜检测

Thin Film Testing

滤光片/光学元件测试

Filter/Optics Testing

原子吸收光谱

Atomic Absorption Spectrum

材料特征检测

Material Feature Testing

环境分析

Environmental Analysis

高光谱成像

Hyperspectral Imaging

气相分析测量

Chromatography Analysis Measurement

光学传感器检测

Optical Sensor Testing

生命科学与生物成像

Life Sciences & Bioimaging

产品概述Overview

光掩膜又称光罩，是微电子制造中光刻工艺所使用的图形母版，由不透明的遮光薄膜在透明基板上形成掩膜图形，并通过曝光将图形转印到产品基板上。在半导体芯片加工制造过程中,光掩膜版表面的温度均匀性要求非常高，需要严格的温度测量和控制。掩膜无线测温系统用于准确测量光掩膜版的温度分布。

A mask, also known as a reticle, is a graphic master used in the photolithography in microelectronics manufacturing. It forms a mask pattern on a transparent substrate by an opaque light-shielding film, and transfers the pattern to the substrate by exposure. The processing and manufacturing process of semiconductor chips has very high requirements on the temperature uniformity of the surface of the photomask, which requires strict temperature measurement and control. Mask wireless temperature measurement system is used to accurately measure the temperature distribution of photomasks.

产品特点Features

1.  体积小、精度高、采样速度快；

2.  温度准确度高达1mK；

3.  采用无线通讯方式，响应时间短，采集频率快，可连续工作时间超过100分钟。

1. Small size, high accuracy, high measurement speed;

2. Temperature accuracy up to 10mK;

3. Wireless communication, short response time, high measurement frequency, continuous working time of more than 100 minutes.

产品参数Parameters 

产品概述Overview

光刻系统是制造芯片的核心装备，其中温度的检测尤为重要，温度会影响光刻胶流动，从而影响光刻的成品率。微型无线温度记录器体积微小，重量轻，携带方便。适用于曝光系统，光刻系统等的温度检测记录。

The photolithography system is the core of chip manufacturing, and temperature detection is particularly important, because temperature will affect the flow of photoresist, thereby affecting the yield of photolithography. Micro wireless temperature recorder is small in size, light in weight, and easy to carry. It is suitable for temperature detection and recording of exposure systems, photolithography systems, etc.

产品特点Features

1. 体积微小、精度高、灵活通用；

2. 温度准确度高达10mK；

3. 采用无线通讯方式，响应时间短，采集频率快，可连续工作时间超过10天。

1. Small size, high accuracy, flexible and versatile;

2. Temperature accuracy up to 10mK;

3. Wireless communication, short response time, high measurement frequency, continuous working time of more than 10 days.

产品参数Parameters