Hunan DeZhi New Material Co., Ltd.

株洲市,  湖南省 
China
http://www.hndezhi.com / www.dzsic.com
  • Booth: T3373

德智新材料,专注于半导体设备零部件材料。

Overview

Hunan Dezhi New Material Co., Ltd. is a high-tech enterprise focusing on the research, development, production and sales of high-end materials such as carbon-based and ceramics. Dezhi is the first company to achieve mass production of Solid SiC etching components for semiconductors in China, and has high-end technology, equipment and a high-level R&D team. The company currently has about 300 employees, of which R&D personnel account for 20%. The company's R&D capabilities and product quality are unanimously recognized by the industry. The main products include CVD@SiC coatings, Solid SiC, Sin@SiC-SiC, CVD@TaC coatings and other series of products, which are widely used in LED optoelectronics, integrated circuits, third-generation semiconductors and other fields.

湖南德智新材料股份有限公司(原名湖南德智新材料有限公司)成立于2017年,位于动力之都株洲,注册资金2437万元,是一家专业从事碳基、陶瓷及其高端材料的研发、生产和销售的高新技术企业,率先实现国内半导体用Solid SiC刻蚀组件产品量产,拥有高端的技术、设备和高水平的研发团队。目前公司共有员工200多人,其中研发人员占比 20%,公司研发能力和产品品质深获业内认可。
公司主营业务为碳基、陶瓷及其高端材料的生产与销售,主要产品包括CVD@SiC涂层、Solid SiC、Sin@SiC-SiC、CVD@TaC涂层等系列产品,广泛应用于LED光电、集成电路、第三代半导体等领域。


  Products

  • CVD @ SiC Coating Series
    Dezhi advanced material products cover carbon-based, ceramic and other high-end materials, used in all aspects of semiconductor chip manufacturing, such as single crystal growth, epitaxy, etching, diffusion, CVD, PVD, etc. ...

  • Dezhi Product Range:  CVD@SiC coating series / Solid SiC series / Sin@SiC-SiC series / CVD@TaC coating series.

    Dezhi advanced material products cover carbon-based, ceramic and other high-end materials, used in all aspects of semiconductor chip manufacturing, such as single crystal growth, epitaxy, etching, diffusion, CVD, PVD, etc. 

    Product performance:

    High Temperature Resistance

    High Pressure Resistance

    Wear Resistance

    High Service Life

    Corrosion Resistance

    High Purity

    Application Scenarios

    Wafer Fabrication

    • Epitaxial

    • Diffusion

    Implementation Technology

    • Precision Machining (Graphite)

    • Low Pressure Chemical Vapor Deposition

    Performance Requirements

    • High density

    • Strong combination

    • High purity

    • High thermal conductivity

    • Corrosion resistance

    • Resistance to cracking

    Application Areas

    • LED Photoelectric

    • Integrated circuits

    • Third-generation semiconductors