Shenzhen Naso Tech Co.,Ltd

深圳,  广东省 
China
https://www.naso-tech.com/
  • Booth: 6732

  Products

  • SILICON CARBIDE EPITAXIAL REACTOR
    Being used in the core process of wide-bandgap semiconductor silicon carbide chip production-Epitaxial Growth,the equipment of Naso Tech adoptsthe horizontal hot-walltechnology route to achieve single-wafer epitaxial growth....

  • ​The temperature field, flow field and other structures are stable, with lower consumable costs and maintenance frequency. The equipment process indicators are excellent, with industry-leading levels of thickness uniformity, doping uniformity, defect density, roughness and etc.