Nanofilm Technologies International Limited

Singapore,  Singapore
http://www.nti-nanofilm.com
  • Booth: 2667

Explore advanced ta-C coating to boost semiconductor yield

Overview

NTI Nanofilm provides advanced thin-film coatings and turnkey equipment for semiconductor backend. Our FCVA ta-C solutions (TAC-ON®, MiCC) enhance wafer lapping carriers, wire-bonding capillaries/tools, and lead-frame carriers with ultra-low friction, high wear resistance, ESD control, and contamination mitigation. We offer coating services, application engineering, and process integration to boost yield, uptime, and tool life

With a strong international footprint, NTI Nanofilm operates offices and facilities in Singapore, Vietnam, China, Japan, India, and Germany, serving customers worldwide with cutting-edge materials science and precision engineering solutions.  Listed on the Singapore Exchange since 2020, NTI Nanofilm is committed to driving innovation and sustainability in high-performance coatings and advanced materials.


  Press Releases

  • As semiconductor manufacturing continues to push toward smaller nodes and higher performance, backend packaging processes are facing increasingly stringent process challenges as well. Lead frames are critical metal structures that provide electrical connections in semiconductor packages, and their positioning accuracy and stability under high-temperature processes directly affect packaging yield and reliability. Therefore, lead frame carriers are used to securely hold lead frames in high-temperature environments to ensure smooth and stable processing.

    However, as advanced packaging technologies evolve, process temperatures are gradually increasing to above 265°C, and traditional carrier coatings such as polytetrafluoroethylene (PTFE) or silicone-based coatings are no longer sufficient. These coatings degrade at high temperatures, causing lead frames to stick, deform, or even tear, which leads to yield loss, equipment downtime, and higher manufacturing costs. Manufacturers urgently need an advanced coating solution with high thermal stability, low adhesion, and long service life.

    Core Challenges in Semiconductor Manufacturing

    As devices shrink and process complexity increases, conventional coatings show clear limitations under thermal and mechanical loads:

    • Adhesion issues: Polymer coatings soften above >200°C, causing lead frames to stick
    • Insufficient coating durability: Thermal fatigue leads to cracking, peeling, and erosion
    • Lower production efficiency: Frequent carrier cleaning results in unplanned downtime

    Why Conventional Coatings Fail in High-Temperature Lead Frame Carriers

    Conventional Coating Advantages Disadvantages Key Failure Mode
    PTFE (Polytetrafluoroethylene) Low friction and non-stick; widely used Performance degrades at 200°C; wears quickly and requires frequent recoating; prone to peeling and contamination Softening at high temperature leads to lead frame sticking and tearing
    PVD Coatings Hard surface; wear resistant High surface energy (~25–50 mN/m); higher friction coefficient (~0.14); thermal expansion mismatch above >200°C Surface adhesion requires frequent cleaning, causing line downtime
    Silicone-based Coatings Initial wear resistance High surface energy and prone to adhesion; rapid degradation at high temperature Short service life and high operating cost
    Oxide Coatings (Al₂O₃, TiO₂, etc.) High-temperature resistant; corrosion resistant Brittle and prone to cracking; high surface energy; complex processing Coating fracture leads to particle contamination

    What Is F-TAC?

    F-TAC is a fluorinated thin-film coating designed specifically for high-temperature, high-throughput semiconductor manufacturing.

    Key Advantages

    • High-temperature stability: Long-term stability above >265°C
    • Ultra-low friction coefficient (<0.1): Effectively prevents sticking and tearing
    • Extended service life: Significantly longer than PTFE, PVD, silicone-based, and oxide coatings
    • Customizable properties: Optimized for different carrier materials and process requirements

    How F-TAC Solves Key Issues for Lead Frame Carriers

    F-TAC fluorinated thin-film coating combines fluorinated surface engineering with nanoscale structural design to form a stable, non-stick protective barrier under extreme conditions above 265°C. Using FCVA (Filtered Cathodic Vacuum Arc) deposition, F-TAC achieves a dense, low-stress, crack-free, and uniform coating to ensure long-term reliability.

    Challenge F-TAC Solution Impact on Lead Frame Carriers
    Extreme high temperature Stable performance at 265°C No deformation, no failure
    Sticking and tearing Ultra-low friction surface (<0.1), contact angle >110° Lead frame damage reduced by ~10%
    Frequent cleaning Durable surface reduces residue Cleaning frequency reduced by ~40%
    Short service life High wear resistance and thermal fatigue resistance Service life is 3–5× that of PTFE / PVD
    Poor material compatibility Customizable parameters Consistent performance across different carrier materials

    Why Semiconductor Manufacturers Choose F-TAC

    In semiconductor manufacturing, even the smallest efficiency gains can translate into significant cost and yield advantages. F-TAC enables engineering teams to maintain stable production under high-temperature conditions while effectively controlling maintenance and replacement costs.

    Metric Observed F-TAC Performance
    Adhesion-related failures Reduced by 83%
    Cleaning cycles Reduced by 70%
    Throughput per takt Improved by 22%
    Coating lifespan Extended by 3–4×

    With its high-temperature stability, low friction, and long service life, F-TAC provides reliable protection for lead frame carriers, helping semiconductor manufacturing achieve higher yield, longer continuous runtime, and lower total cost of ownership.

    To learn how F-TAC can improve your lead frame carrier performance, contact us for a technical consultation, sample evaluation, or to download product information.

  • Driven by applications such as artificial intelligence, edge computing, and wearable technologies, semiconductor devices continue to evolve toward smaller dimensions and higher complexity, and packaging technologies must advance in parallel. 3D integration and advanced packaging architectures require finer gold wires and smaller pad sizes, which subjects bonding tools to higher mechanical stress.

    Although flip-chip processes have been adopted in some high-density applications, they still have limitations in reworkability and thermal resistance. Thanks to its flexibility, lower cost, and suitability for high-volume production, wire bonding remains the dominant interconnect method.

    However, miniaturization also brings new mechanical challenges—one of the most critical is tool wear. When bonding tools repeatedly contact abrasive wire materials, their surfaces degrade rapidly, leading to increased downtime, more frequent tool replacement, and unstable bond quality. Addressing this issue is essential to maintain high efficiency and stable yield.


    What Is Wire Bonding?

    Wire bonding is a process that uses ultra-fine gold, copper, or aluminum wires to create electrical connections between a semiconductor die and its package, and is widely used in devices such as CPUs, memory, and sensors. The main steps include:

    • Ball bonding to form the initial contact using heat and pressure

    • Wedge bonding to attach the wire to the substrate using ultrasonic energy

    • Forming loops to avoid shorts and maintain spacing

    Today, more than 75% of semiconductor devices still rely on wire bonding, due to its high adaptability, cost-effectiveness, and ability to support a wide range of applications.


    Key Challenges in Wire Bonding Today

    As packaging continues to miniaturize, multiple issues are beginning to affect production yield and reliability:

    Challenge

    Impact

    Tool wear

    Abrasive wire materials accelerate capillary wear, increasing replacement frequency and downtime

    Contamination

    Particle adhesion can reduce yield by up to 30%

    Thermal stress

    High temperatures soften tools and cause misalignment

    Electrostatic discharge (ESD)

    ESD may introduce latent defects

    Among these, tool wear has the most direct impact on operating efficiency and long-term cost.


    Why Conventional Coatings Fail

    Conventional tool coatings often cannot withstand the stringent requirements of modern bonding processes, as many solutions lack the hardness and durability needed to prevent early-stage wear. A comparison of common coatings is shown below:

    Coating Type

    Advantages

    Disadvantages

    Failure Mode

    Conventional DLC

    Moderate wear resistance

    Low hardness (15 GPa)

    Prone to cracking and delamination

    Palladium-plated copper

    Oxidation resistant

    Unstable bonding quality

    Insufficient interfacial reliability

    Gold (Au)

    High conductivity

    Rapid intermetallic compound growth

    Leads to mechanical failure

    Bare copper (Cu)

    Low cost

    Prone to oxidation

    Surface damage and insufficient bond strength

    The industry urgently needs a tougher, longer-lasting coating solution to reduce tool wear and improve production efficiency.


    TAC-ON®: Enhancing Wire Bonding Precision

    TAC-ON® coating from Nanofilm Technologies (NTI Nanofilm) is a next-generation diamond-like carbon solution developed to extend the service life of wire bonding tools. It delivers ultra-high hardness and a smooth surface while maintaining excellent thermal stability and electrical stability.

    Issue

    TAC-ON® Solution

    Impact

    Tool wear

    Hardness up to 40 GPa (2.5× stronger than conventional DLC)

    Tool life extended by 3–5×

    Contamination

    Ultra-smooth surface (Ra < 0.1 nm)

    Yield improved by 30%

    Thermal stress

    Withstands up to 600 °C

    Maintains stable alignment

    Electrostatic damage

    ESD-safe properties (10⁵–10⁹ Ω/□)

    ESD failures reduced by over 80%


    TAC-ON® vs. Conventional Solutions

    Metric

    TAC-ON®

    Conventional Solutions

    Improvement

    Tool life

    Extended by 3–5×

    Standard

    75% fewer replacements

    Yield

    98%

    68%

    Improved by 30%

    ESD failures

    <5%

    25%

    Reduced by 80%


    Conclusion

    Tool wear is one of the most persistent bottlenecks in modern wire bonding processes. It reduces production efficiency, increases tooling cost, and disrupts yield stability. TAC-ON® coating from Nanofilm Technologies addresses this critical challenge directly with a high-hardness, long-life diamond-like carbon structure.

    By reducing tool-change frequency, extending capillary life, and maintaining process consistency, TAC-ON® helps manufacturers optimize throughput and reduce operating costs. In an era of continued semiconductor miniaturization, high-precision functional coatings like this have become essential to achieving sustainable high-volume manufacturing performance.

  • With the rapid growth of applications such as artificial intelligence, electric vehicles, and industrial automation, the semiconductor industry is moving toward larger wafer sizes (300 mm, 450 mm and beyond) and more advanced packaging architectures. This trend places unprecedented performance demands on critical backend components such as Lapping Carriers.

    During wafer thinning, double-side lapping, and CMP polishing processes, carriers must ensure thickness uniformity (TTV control), edge protection, wear resistance, and chemical stability. However, the long-relied-on PVD / PECVD DLC coatings are gradually revealing their limitations:

    • Larger wafers introduce higher mechanical loads and stress

    • Coating wear, microcracks, and delamination become more severe

    • Chemical erosion caused by CMP slurry

    • Frequent recoating and replacement increase downtime

    • Yield may decline by 0.5–2%, increasing overall manufacturing costs

    In today’s environment where high throughput and high yield define core competitiveness, conventional solutions are clearly no longer sufficient to support the next stage of process requirements.


    Where Are the Limits of Conventional DLC Coatings?

    DLC (Diamond-Like Carbon) coatings have long been applied to lapping carriers due to their high hardness and low friction properties, and are mainly deposited via PVD or PECVD processes:

    • PVD DLC: High hardness and acceptable adhesion, but higher residual stress makes it prone to delamination during long-term operation.

    • PECVD DLC: Good coverage and suitable for complex geometries, but more susceptible to wear and oxidation under high load and chemical environments.

    As wafer sizes continue to increase and process pressures rise, these disadvantages are further amplified, shortening coating lifespan, increasing contamination risks, and directly impacting production line stability.


    TAC-ON® Solution Powered by FCVA Technology

    To address these challenges, TAC-ON® ta-C coating utilizes FCVA (Filtered Cathodic Vacuum Arc) technology to redefine performance standards for lapping carrier coatings.

    Compared with conventional DLC, TAC-ON® achieves comprehensive breakthroughs in key metrics:

    • Ultra-high hardness (~40 GPa): Significantly improves wear resistance and extends carrier service life

    • Excellent adhesion: Resistant to delamination even under high stress, reducing contamination risks

    • Low friction coefficient (~0.1): Reduces debris generation and improves wafer surface quality

    • Uniform low-temperature deposition: Reduces internal stress, prevents pinholes and cracks, and enhances process stability


    Technical Comparison: TAC-ON® vs. Conventional DLC

    Performance Metric

    TAC-ON® (FCVA ta-C)

    Conventional DLC (PVD / PECVD)

    Diamond Content

    ~85%

    ~25%

    Hardness

    ~40 GPa

    ~15 GPa

    Wear Rate

    <10⁻⁸ mm³/Nm

    ~8×10⁻⁸

    Friction Coefficient

    ~0.1

    ~0.14

    These technical advantages are not only reflected in laboratory data, but also translate directly into operational benefits on the production floor.


    The Business Value of Upgrading to TAC-ON®

    For wafer manufacturers pursuing high efficiency and scalable production, adopting TAC-ON® coating means:

    • Lower maintenance cost and downtime: Longer lifespan and reduced recoating frequency

    • Improved yield: Reduced contamination and defects, lowering rework and scrap

    • Maintained tight tolerances: Thinner yet stronger coating that does not compromise carrier dimensional stability

    • Enhanced mass production capability: Supporting high-output demands driven by AI and advanced packaging


    Conclusion

    As wafer sizes continue to increase and process requirements become more stringent, conventional DLC coatings are gradually becoming insufficient to support the long-term reliable operation of lapping carriers. TAC-ON® FCVA ta-C coating, with its higher hardness, superior adhesion, and low friction properties, provides a more durable, stable, and cost-effective upgrade path for backend processes.

    For manufacturers aiming to stay competitive in the highly competitive semiconductor industry, advanced coating technology is becoming an indispensable strategic pillar.


  Products

  • MiCC® 纳米晶氮化铬 陶瓷涂层
    MiCC®(纳米晶铬氮化物陶瓷涂层)采用专利 FCVA 技术沉积超薄铬氮化物涂层,具备卓越硬度与低摩擦特性。相较于传统 CrN 涂层,MiCC® 可有效减少黏附,确保顺畅脱模,延长零部件使用寿命,并显著提升生产效率。 适用应用包括:模具型腔、取放系统...

  • 项目 参数
    涂层成分 CrN(氮化铬)
    涂层厚度(µm) 1 – 4
    显微硬度(HV) 1,800
    摩擦系数 < 0.11
    涂层工艺温度(°C) 150
    最高耐受温度(°C) 700
    涂层颜色 银灰色
  • TAC-ON®四面体非晶 碳涂层
    TAC-ON ®具备卓越硬度、低摩擦系数 及优异的缺陷控制能力,可显著提升产品 良率与生产可靠性。 该涂层适用于游星轮、引线框架载具及 高端半导体设备,提供完整的摩擦学 解决方案。...

  • 项目 参数
    涂层成分 ta-C(四面体非晶碳)
    涂层厚度(µm) 1 – 4
    显微硬度(HV) 3,000
    摩擦系数 < 0.1
    涂层工艺温度(°C) 80
    最高耐受温度(°C) 500
    涂层颜色 深灰色
  • ASD防静电涂层
    ASD防静电涂层能为敏感半导体元器件提供静电防护,有效规避静电放电风险,确保在所有制造阶段均能实现更高的可靠性与稳定性。 我们的ASD解决方案特别适用于晶圆加工、芯片封装与组装环节,为关键半导体应用提供精准可靠的防护保障。...

  • 项目 参数
    涂层成分 ta-C 与 DLC 复合涂层
    涂层厚度(µm) 4 – 6
    显微硬度(HV) 2,500
    摩擦系数 < 0.1
    涂层工艺温度(°C) < 150
    最高耐受温度(°C) 400
    涂层颜色 深灰色
    ```

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