上海捷热科技有限公司

  • Booth: 2527

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Overview

    上海捷热科技有限公司(下称“捷热”)是一家专注于超高精度测控温产品设计、研发、生产及销售的国家高新技术企业,总部位于上海,并在南通设立生产基地。捷热聚焦超高精度测控温产品的国产化替代,致力于解决国家重大基础研究问题。

     捷热对标国际品牌产品,紧追国际先进技术水平,测控温精度最高达到μK量级,实现了产品化并通过了客户验证。现有核心类产品高精度热敏电阻温度传感器、原位无线测温晶圆系统、原位高温无线测温晶圆系统、超薄标签式温度记录器、低温精密控温仪、四通道测温仪FB604等。

     捷热技术团队凭借20多年来在测控温行业积累的研发能力和品控经验,将先进测控温技术和综合解决方案广泛应用至半导体、量子、计量、电力、石油、化工、冶金、制药、食品、交通等行业,服务用户包括权威计量机构、芯片制造公司、各大研究院所等高精尖企业。


  Products

  • High-accuracy Thermistor Temperature Sensor
    Thermistor is a heat-sensitive resistor, and its resistance changes significantly with the change of temperature.The operating temperature range is 0 ℃ ~ 60 ℃ ,covering the temperature range required for basic daily temperature measurement and control....

  • Overview

    Thermistor is a heat-sensitive resistor, and its resistance changes significantly with the change of temperature.The operating temperature range is 0 ℃ ~ 60 ℃ ,covering the temperature range required for basic daily temperature measurement and control, and is the most used temperature sensor.It can be widely used in various industries, including but not limited to temperature monitoring, automatic control systems and electronic equipment. Our products are excellent in temperature sensitivity, stability and accuracy, providing customers with reliable temperature control solutions. 

    Features

    a. This thermal sensor is stainless steel armored and with a 4-wire system rear lead;

    b. Excellent accuracy and stability, temperature accuracy up to 1mK;

    c. Excellent thermal response capability, suitable for high-precision application scenarios that are sensitive to temperature changes.

  • In-situ Scanner Temp System
    In-situ Scanner Temp System supports monitoring of dry, immersion and EUV lithography scanners. In-situ Scanner Temp System produces high accuracy temporal and spatial wafer temperature data....

  • Overview

    In-situ Scanner Temp System supports monitoring of dry, immersion and EUV lithography scanners. In-situ Scanner Temp System produces high accuracy temporal and spatial wafer temperature data that can assist lithography engineers monitor scanner thermal variations that affect pattern overlay performance. With a standard-thickness(12 inches) wafer format, this system can be used to monitor lithography thermal uniformity and stability with high precision and low noise, enabling scanner qualiffcation and matching.

    Features

    a. High precision, ffexible application, fast sampling speed;

    b. Scanning speed up to 4Hz, temperature accuracy up to 10mK;

    c. Point-to-point wireless communication.

  • TC-Wafer Temperature Measuring System
    The TC-Wafer Temperature Measuring System is designed to collect temperature data from the environment of process equipment. The system comprises the TC-Wafer unit and computer testing software....

  • Overview

    The TC-Wafer Temperature Measuring System is designed to collect temperature data from the environment of process equipment. The system comprises the TC-Wafer unit and computer testing software. It features channels ranging from 1 to 34, capable of measuring a broad spectrum of temperatures. The system ensures real-time transmission of collected data, communicating with the computer via wired modes such as RS485, USB, or Ethernet. It also includes functions for data collection, storage, analysis, curve drawing, and cloud mapping.

    Features

    a. The collection channels range from 1 to 34;

    b. The temperature measurement range is wide, from 0℃ to 1100℃ ;

    c. Diverse communication methods, such as RS485, USB, or Ethernet;

    d. For further analysis of temperature data, curves and cloud maps can be drawn.

  • RTD-Wafer Temperature Measurement System
    RTD-Wafer temperature measurement system provides high precision, in-situ hot plate temperature measurement and supports processes such as photoresist tracking systems and wafer detectors....

  • Overview

    RTD-Wafer temperature measurement system provides high precision, in-situ hot plate temperature measurement and supports processes such as photoresist tracking systems and wafer detectors. The system directly measures wafer temperature stability and uniformity without relying on contact temperature sensors. With this system, lithography engineers can measure and ffne-tune the photoresist baking temperature uniformity to ensure that the advanced lithography process meets the temperature accuracy required to achieve high yields.

    Features

    a. High precision, fast acquisition speed that can be up to 8Hz;

    b. Above the wafer is less than 2mm;

    c. Dependable stability,sensor with less risks of neither falling off nor breaking the line.

  • Mask Wireless Temp System
    Mask Wireless Temp System is used for qualiffcation and monitoring of e-beam writers as extreme temperature stability is required over the extended time period (up to 24 hours) to completely write a mask....

  • Overview

    Mask Wireless Temp System is used for qualiffcation and monitoring of e-beam writers as extreme temperature stability is required over the extended time period (up to 24 hours) to completely write a mask.Mask Wireless Temp System collects temperature data for 24 consecutive hours, providing mask manufacturers with the data needed to ensure the thermal stability of the system prior to writing critical masks.

    Features

    a. Small size, high accuracy, high measurement speed;

    b. Temperature accuracy up to 10mK;

    c. Wireless communication, short response time.