Prinano Technology Co.,Ltd

The PL-A nanoimprint system is a air cushion nanoimprint system that is compatible with wafers or square substrates with a maximum diameter of 300mm.

Its unique controllable demolding function can be applied to nanoimprint processes with variable cycles and multi-directional demolding requirements.

PL-A uses flexible composite template imprinting technology to ensure that the imprinting pressure uniformity error of the entire wafer surface is less than 0.5% during the imprinting process; under special process conditions, it can achieve a nanoimprinting process without a residual layer, and supports curved surface imprinting processes.

The PL-SR series is a step-and-repeat nanoimprint lithography system that utilizes a plate-to-plate imprinting method. It features a proprietary template profile control and dynamic alignment systems, significantly reducing defects during the imprinting process and achieving high-precision alignment with an accuracy of less than ±1μm. The system is equipped with a high-precision inkjet printing system, offering precise residual layer control and high-accuracy template stitching capabilities.

The PL-SR is capable of panelizing wafers up to 12 inches in diameter, demonstrating substantial application potential in the fields of optics and semiconductors.