Veeco Instruments GmbH

Einsteinring 22
Aschheim,  85609

Germany
http://www.veeco.com
  • Booth: A4457


Our technical experts look forward to seeing you in Munich!

Veeco is a global leader in thin film process technologies, advanced packaging lithography, wet etch & clean, 3D wafer inspection, laser spike annealing and laser melt, atomic layer deposition, molecular beam epitaxy, ion beam technologies, and metal organic chemical vapor deposition systems. We are a technology company that develops, manufactures, sells and supports process equipment designed to meet the demands of megatrends such as enhanced mobility/5G, increased connectivity, artificial intelligence, augmented reality, autonomous/electric transportation, and energy efficiency among others. 

Our products and services help our customers optimize the manufacture of semiconductors, memories, EUV mask blanks, VCSELs, photonics, advanced LEDs and displays, power electronics, compound semiconductors, hard disk drives, MEMS, wireless chips and more. With equipment designed to optimize performance, yield and cost of ownership for our customers, we hold technology leadership positions in all these served markets.


 Press Releases

  • Veeco Instruments Inc. announced that Aledia, a developer and manufacturer of next-generation 3D LEDs for display applications based on its gallium-nitride-nanowires-on-silicon platform, has selected Veeco’s Propel® GaN MOCVD system to support advanced research and development. Aledia noted the tool’s large process window, single-wafer reactor technology and defect stability as key factors in its decision to adopt the Propel system. 

    “We believe that the opportunity for our breakthrough nanowire-LED display technology on large-area silicon is very large, and we need the best and most scalable technology available to support our continued R&D around 3D display applications—we believe Veeco is best positioned,” stated Giorgio Anania, CEO, chairman and co-founder of Aledia. “Veeco’s cutting-edge Propel system delivers unsurpassed results, and very good homogeneity throughout the entire wafer, making it the best choice and one we know will help us continue to push the limits of innovation.”

    Designed for leading-edge GaN applications like power, RF, laser diodes and advanced LEDs, the Propel system’s single-wafer reactor platform enables the processing of six- and eight-inch wafers or two- to four-inch wafers in a mini-batch mode. In addition to Veeco’s proprietary TurboDisc technology, the system also includes Veeco’s IsoFlange™ and SymmHeat™ technologies, which provide homogeneous laminar flow and uniform temperature profile across the entire wafer.

    “On the heels of the company’s previous adoption of Veeco’s K465i™ MOCVD system, Aledia’s decision to turn to Veeco once again to support future generations of nanowire-LED technologies for mobile displays is a testament to our shared commitment to excellence,” noted Peo Hansson, Ph.D., senior vice president and general manager of MOCVD at Veeco. “We look forward to our continued partnership and to support Aledia as it continues to innovate new discoveries in the LED space.”

    Innovators in display technology are focusing on the next big technological shifts such as micro-LED and 3D LED. Industry analysts predict a scenario where the market for advanced LED displays could potentially reach 330 million units by 2025. This optimism is fueled by the promise of sub-100 micrometer LEDs, which is considered the critical enabler to achieving the ultimate display. 

    About Veeco

    Veeco (NASDAQ: VECO) is a leading manufacturer of innovative semiconductor process equipment. Our proven MOCVD, lithography, laser annealing, ion beam and single wafer etch & clean technologies play an integral role in producing LEDs for solid-state lighting and displays, and in the fabrication of advanced semiconductor devices. With equipment designed to maximize performance, yield and cost of ownership, Veeco holds technology leadership positions in all these served markets. To learn more about Veeco's innovative equipment and services, visit www.veeco.com. 

  • Veeco Instruments Inc. announced that the Materials for Energy Conversion and Storage Group (MECS) at Delft University of Technology has ordered its Fiji® F200™ Plasma-Enhanced Atomic Layer Deposition (PE-ALD) system. Based in The Netherlands, MECS selected the Veeco tool for its superior performance for research on state-of-the-art materials for renewables, storage and advanced energy solutions. 

    “Our colleagues with the Kavli Nanolab at Delft have reported great success working with the Fiji F200 for their nanotechnology R&D, and we are confident the system’s capabilities will also serve us well as we pursue new materials for sustainable energy applications,” said Fokko Mulder, professor of applied sciences and integrated energy systems at Delft University of Technology. “In particular, we were drawn to the Fiji’s world-class reputation, flexible PE-ALD system architecture, and excellent service and support backed by the technical expertise of Veeco’s ALD scientists. After evaluating different options, the Fiji F200 proved the best platform to meet our advanced experimentation needs.” 

    The Fiji series is a modular, high-vacuum ALD system that accommodates a wide range of thermal and plasma-enhanced deposition modes using multiple configurations of precursors and gases. Veeco continues to be in the forefront of ALD R&D for energy storage with premier research published in the field of solid-state lithium- and sodium-ion batteries, including stoichiometric multicomponent lithium oxides for higher capacity 3D electrodes, safer solid-state electrolytes, and ultrathin phosphate/aluminate encapsulation layers for improved battery lifetime. With over 500 systems installed worldwide, Veeco’s ALD platforms are used in a wide variety of research and industrial environments, including 3D nanofabrication, electronics, batteries, solar cells, energy and compound semiconductors, as well as exciting new applications to solve some of the world’s most pressing technology and resource challenges. 

    “The MECS group is one of the top research departments in the world working to meet the growing demand for renewable sources and energy storage solutions,” said Gerry Blumenstock, vice president and general manager of MBE and ALD products at Veeco. “We look forward to helping Professor Mulder and his team at Delft to maximize the benefits of ALD for this important research.” 

    According to the U.S. Energy Information Administration, global energy consumption will increase by 28 percent between 2015 and 2040, and renewables are the fastest-growing energy source with adoption expected to increase by an average of 2.3 percent each year through 2040. The intermittent nature of renewables is also driving the importance of advanced energy storage research and solutions. The global market for energy storage of renewables is predicted by Navigant Research to grow exponentially from its current nascent stage to reach $23 billion by 2026. 

    About Veeco

    Veeco (NASDAQ: VECO) is a leading manufacturer of innovative semiconductor process equipment.  Our proven MOCVD, lithography, laser annealing, ion beam and single wafer etch and clean technologies play an integral role in producing LEDs for solid-state lighting and displays, and in the fabrication of advanced semiconductor devices.  With equipment designed to maximize performance, yield and cost of ownership, Veeco holds technology leadership positions in all these served markets.  To learn more about Veeco's innovative equipment and services, visit www.veeco.com. 

  • Prestigious Research Institute Cited Veeco’s Expertise in MBE and the High Reliability and Customization of the GEN10™ as Key Factors in its Decision 

    Veeco Instruments Inc. announced that a dual chamber GEN10™ automated molecular beam epitaxy (MBE) cluster system won the tender offer by the Max Planck Institute of Microstructure Physics, Halle (Saale), Germany (MPI-MSP) to support world-class research on complex oxides. Demand for oxide-nitride layer structures has increased due to their enormous potential in enabling next-generation energy-efficient nano-devices and advanced data storage. The department of Nano-systems from Ions, Spins and Electrons (NISE) at the MPI-MSP will leverage Veeco’s MBE technology to expand research and develop innovative applications.

    “Our team is highly interested in exploring the properties of atomically engineered oxide-nitride layer structures especially because of their extraordinary properties but also for their potential in paving the way to novel energy-efficient nano-devices,” said Stuart Parkin, Director of the NISE Department at the MPI-MSP and Alexander von Humboldt Professor, Martin Luther University Halle-Wittenberg, Halle. “Veeco’s reputation and expertise in MBE combined with the GEN10’s high reliability, throughput, customization and automation capabilities will help support our research into novel materials.” 

    This win at MPI marks the first time Veeco has provided a fully integrated solution for a concentrated ozone source. The GEN10 allows for up to three configurable, material-specific growth modules, enabling high system utilization and allowing multiple researchers use the system at the same time to perform unattended growth. By expanding its reach in the R&D sector worldwide, Veeco is leading the way in helping grow complex oxide structures. 

    “As our MBE systems continue to expand their footprint in the global R&D space, we are honored that Veeco’s GEN10 MBE system was selected by the highly respected Max Planck Institute of Microstructure Physics in Halle,” noted Gerry Blumenstock, vice president and general manager of MBE and ALD products at Veeco. “We are pleased with the confidence Dr. Parkin and his team placed in our MBE expertise and we look forward to supporting the MPI-MSP as it continues to lead R&D exploration and applications for complex oxides.”

    About Veeco

    Veeco (NASDAQ: VECO) is a leading manufacturer of innovative semiconductor process equipment. Our proven MOCVD, lithography, laser annealing, ion beam and single wafer etch & clean technologies play an integral role in producing LEDs for solid-state lighting and displays, and in the fabrication of advanced semiconductor devices. With equipment designed to maximize performance, yield and cost of ownership, Veeco holds technology leadership positions in all these served markets. To learn more about Veeco's innovative equipment and services, visit www.veeco.com. 

    Media Contact: David Pinto | 408-325-6157 | dpinto@veeco.com

    Investor Relations Contact:  Anthony Bencivenga | 516-677-0200 x1308 |  investorrelations@veeco.com

  • One of the World’s Largest Outsourced Assembly and Test Providers Names AP300E™ Their Preferred Lithography System Due to Veeco’s Industry-Leading Uptime and Process Performance

    Veeco Instruments Inc. announced  that one of the world’s largest outsourced assembly and test (OSAT) providers has purchased multiple Veeco AP300E lithography systems. Complementing the OSAT’s previously installed Veeco tools, the AP300E was selected based on its superior uptime, lower total cost of ownership (CoO) and exceptional performance. This purchase is illustrative of continued strong market demand for Veeco’s expanding portfolio of lithography systems, given the tools’ ability to handle next-generation advanced packaging process needs including copper (Cu) pillar, wafer-level packaging (WLP), fan-out WLP (FOWLP) and 3D integrated circuit developments. 

    The AP300E lithography stepper’s exceptional overlay, resolution, sidewall profile performance and broadband flexibility enable highly automated, cost-effective manufacturing valued by foundries and OSATs for applications such as fan-in WLP, FOWLP, through-silicon via, silicon interposer solder and Cu pillar bumping. Given the exponential market growth expected in mobile, IoT and artificial intelligence (AI) applications, OSATs seek to ensure they are competitively positioned to drive customer acquisition and retention. According to Yole, the equipment and materials market for FOWLP alone will expand at a compound annual growth rate (CAGR) of 43 percent to reach $694 million by 2021.

    “Increased mobility, IoT, AI and deep learning are seeing explosive growth in step with global megatrends, all of which are enabled by technologies like 3D integration and advanced packaging,” noted Peter Porshnev, Ph.D., senior vice president and general manager of Veeco’s Ultratech business unit. “As we grow our customer base, Veeco’s experienced team of technologists continues to work closely with OSATs and foundries to deliver industry-leading innovations that directly address their performance, yield and CoO challenges.” 

    About Veeco

    Veeco (NASDAQ: VECO) is a leading manufacturer of innovative semiconductor process equipment.  Our proven MOCVD, lithography, laser annealing, ion beam and single wafer etch and clean technologies play an integral role in producing LEDs for solid-state lighting and displays, and in the fabrication of advanced semiconductor devices.  With equipment designed to maximize performance, yield and cost of ownership, Veeco holds technology leadership positions in all these served markets.  To learn more about Veeco's innovative equipment and services, visit www.veeco.com

  • Leader in Optics and Imaging Strengthens Capabilities with Precision Coating Technology and Additional Investments

    Barrington, NJ, and Plainview, NY—Edmund Optics®, the world’s leading supplier of optical components, has ordered the  SPECTOR® Ion Beam Sputtering System from Veeco Instruments Inc. The new capability is in support of Edmund Optics’ expanding portfolio of high quality laser optics for infrared, visible, and ultraviolet systems. Edmund Optics’ growing presence in the laser optics landscape builds on the company’s long history as a supplier of high quality imaging and photonics components. The SPECTOR platform represents Edmund Optics’ most recent financial and technical commitment to advancing state-of-the-art optics fabrication, adding to the company’s existing expertise in aspheric design and manufacturing, advanced optical metrology, and production of optics designed for high laser fluence applications. 

    “The SPECTOR platform gives us two essential elements: the best tool available to support precision and custom optical coatings, and the best partner to support our technical needs,” said Joel Bagwell, director of engineering and manufacturing technology at Edmund Optics. “Veeco fit the bill perfectly on both counts. The SPECTOR’s ability to create extremely high quality, high performance films is especially important for our laser optics coatings, and will help expand our portfolio to encompass new and emerging applications. As a company that holds customer service as our highest priority, we were also impressed with Veeco’s demonstrated track record of successfully supporting customers with global reach— the kind of service we provide to our customers and we seek from our suppliers.”

    The SPECTOR ion beam sputtering platform offers exceptional layer thickness control, enhanced process stability, and the lowest published optical losses in the industry. The tool is engineered to improve key production parameters, such as target material utilization, optical endpoint control, and process time for cutting-edge optical coating applications. The SPECTOR platform, which is the preferred ion beam sputtering system in the industry, has been installed in more than 200 advanced manufacturing settings across the world. The system is consistently chosen by manufacturers for the qualitative advantages of ion beam sputtering technology—low scatter loss, high film purity, stable deposition rates, and film thickness control of less than 0.1nm.

    “Edmund Optics is a premier provider of optical components, known for providing the highest quality products for the life sciences, biomedical, semiconductor, defense, and research and development markets,” said Adrian Devasahayam, Ph.D., vice president and general manager of advanced deposition and etch products at Veeco. “Their selection of Veeco’s SPECTOR ion beam sputtering system further demonstrates the platform’s flexibility to support a wide range of applications with unmatched control and precision.”

    Optical coatings are valuable in a wide variety of commercial categories including telecom, defense, architecture, medical, solar, transportation, and industrial, as well as consumer categories including flat-screen TVs, computers, tablets, cell phones, and eyeglass coatings. According to BCC Research, the global market for optical coatings is expected to reach $14.2 billion in 2021, up from $9.5 billion in 2016. The commercial segment in particular is expected to grow from $5.4 billion in 2016 to $9.4 billion in 2021—demonstrating a five-year compound annual growth rate (CAGR) of 11.5 percent. Key drivers of this growth are emerging applications in commercial and consumer categories, as well as innovative coatings to improve existing applications.

    About EO

    Edmund Optics® is a leading supplier of optics, imaging, and photonics technology for the Life Sciences, Biomedical, Semiconductor, R&D, and Defense markets around the globe. EO designs and manufactures a wide array of multi-element lenses, lens coatings, imaging systems, and optomechanical equipment, while supporting OEM applications with volume production of both stock and custom products. EO’s state-of-the-art manufacturing capabilities, combined with its global distribution network, has earned it the position of the world’s largest supplier of off-the-shelf optical components. Customers can purchase items by calling 1-800-363-1992, via the catalog or the website at https://www.edmundoptics.com/.

    About Veeco

    Veeco (NASDAQ: VECO) is a leading manufacturer of innovative semiconductor process equipment. Our proven MOCVD, lithography, laser annealing, ion beam and single wafer etch and clean technologies play an integral role in producing LEDs for solid-state lighting and displays, and in the fabrication of advanced semiconductor devices. With equipment designed to maximize performance, yield and cost of ownership, Veeco holds technology leadership positions in all these served markets. To learn more about Veeco's innovative equipment and services, visit www.veeco.com.


 Products

  • TurboDisc EPIK 868 MOCVD System
    Leading-edge performance with maximum productivity in a compact cluster architecture ...

  • Veeco’s new EPIK 868 MOCVD system is the Advanced LED industry’s highest productivity MOCVD system that reduces cost per wafer approximately 22% compared to previous generations.

    • Designed for emerging applications such as mini-LED and micro-LED
    • Production proven TurboDisc reactor technology enables industry’s leading LED device performance
    • High capital efficiency and high footprint efficiency provides lowest cost of ownership
    • High throughput and reliable architecture delivers high volume manufacturing

    Available in a four-reactor configurations, EPIK 868 features breakthrough technologies including the proprietary IsoFlange™ and TruHeat™ technologies that provide homogeneous laminar flow and uniform temperature profile across the entire wafer carrier. These technological innovations produce wavelength uniformity to drive higher yields in a tighter bin. The EPIK 868 system offers a 2.3x throughput advantage over the EPIK 700 system due to its larger reactor capacity and wafer carrier size. Designed for mass production, EPIK 868 accommodates 124x4” and 48x6” wafer carrier sizes. Customers can easily transfer processes from existing TurboDisc systems to the new EPIK 868 MOCVD platform for quick-start production of high quality LEDs. 

  • AP200/300 Lithography for Advanced Packaging
    Delivers superior overlay, resolution & side wall profile performance for highly-automated cost- effective manufacturing. Well suited for copper pillar, fan-out, through-silicon via, silicon interposer & more......

  • Superior Operational Flexibility for Multiple Applications
    > World-class HVM proven platform with full automation, selectable exposure wavelength and universal wafer size capability (6 & 8-in or 8 & 12-in wafers)
    > Adjustable Numerical Aperture projection optics for maximum DoF in thick and thin resists with 0.8 to 2.0 μm minimum resolution
    > Backside or buried layer IR alignment option for advanced processes including interposers and TSVs

    Key AP200/300 Stepper Advantages
    > Broadband Projection Lens 
    > Variable NA for Enhanced Resolution and Large Depth-of-Focus
    > Wafer Edge Processing for Electroplating Processes
    > Highest Economic Value with Lowest Production Risk

    Warped Wafer Handling 

    > Expands process window and yield for warped wafers by reducing chucked wafer flatness 
     

    Full Wafer Mapping (Optical Focus)

    > Improves yield for smaller FOWLP feature sizes by providing full wafer topography map with ability to specify up to six locations per field for extremely accurate shot by shot focusing


    Variable NA Projection Optics
    > Enables high aspect ratio lithography, large depth-of-focus and high wafer plane irradiance for thick resist applications

    Sub 1μm Line/Space Resolution
    > Reduces cost of high connectivity packages and expands application space by significantly increasing overall I/O density

  • Propel Power GaN MOCVD System
    Single-Wafer Reactor Technology to Enable Efficient, Gallium Nitride Based Power Devices...

  • Veeco’s Propel™ Power GaN MOCVD system is designed specifically for the power electronics industry. Featuring a single-wafer reactor platform, capable of processing six- and eight-inch wafers, the system deposits high-quality GaN films for the production of highly efficient power electronic devices. The single-wafer reactor is based on Veeco’s leading TurboDisc® design with breakthrough technology, including the new IsoFlange™ and SymmHeat™ technologies that provide homogeneous laminar flow and uniform temperature profile across the entire wafer. Customers can easily transfer processes from Veeco K465i™ and MaxBright™ systems to the Propel Power GaN MOCVD platform.

    • Outstanding film uniformity, yield and device performance
    • Features long campaign runs and low particle defects for exceptional yield and flexibility
    • Fast cycles of learning accelerate GaN-on-Si R&D transition to high-volume manufacturing
    • Modular design for ease of configuration, operation and maintenance


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