Rapid Thermal Processing / Chemical Vapor Deposition systems
Annealsys designs and manufactures Rapid Thermal Processing (RTP and RTCVD) and Direct Liquid Injection deposition (CVD and ALD) systems.
RTP systems with cold wall chamber, high temperature lamp furnaces (1450°C) and high vacuum capability from 3-inch to 200 mm for RTP and RTCVD processes. Applications: rapid thermal annealing, RTO, RTN, contact annealing, CVD of graphene and h-BN, selenization (CIGS)...
High temperature RTP / RTCVD furnace up to 2000°C for silicon carbide implant annealing and graphene by CVD and sublimation.
Direct Liquid Injection deposition systems for deposition of metals, oxides, nitrides, metals, 2D materials, III-V, etc. These systems can perform deposition processes with the widest range of chemicals including low vapor pressure and thermally unstable chemicals. They have multi process capabilities inside the same process chamber: CVD, ALD, MOCVD and pulse pressure CVD. The 2-inch system with infrared lamp heating extends the process capabilities with RTP and RTCVD. It is a unique machine on the market for process development of new materials.
Web site: www.annealsys.com