The AS-Master system is 200 mm cold wall chamber Rapid Thermal Processor. The system can receive a susceptor with a maximum outer diameter of 240 mm for processing 200 mm wafers or batch of smaller wafers.
The cold wall chamber technology provides significant advantages: high process reproducibility, higher cooling rate, accurate temperature measurement and contamination free environment.
Several halogen lamp furnaces versions are available with a high temperature version that can perform processes up to 1450°C. The cold wall chamber technology associated with the pulse control mode of the lamp furnace allows processing thermally sensitive substrates.
The fast cooling option increases the cooling rate by 4 times compare to conventional RTP systems.
The system can be provided with customized loading systems including loading of the wafers on or into graphite susceptors for annealing of materials with low infrared absorption.