The industry-leading NSR-S635E ArF immersion scanner leverages the proven Streamlign platform, incorporating the latest developments in lens, autofocus, alignment, and defectivity minimization technology to deliver unparalleled multiple patterning performance and productivity.
The S635E has demonstrated world-class single machine overlay (SMO) of ~ 1 nm across a single lot in precision mode, as well as five lot data below 1.4 nm (Avg. +3σ) in standard mode. The S635E can also be coupled with the Nikon inline alignment station (iAS) to further enhance scanner on-product overlay performance and productivity.
The NSR-S635E can process up to 275 wafers per hour. In addition, nozzle innovations prevent immersion defects, while enhanced overlay and focus stability contribute to maximized tool productivity and fab daily output. These elements ensure world-class device patterning and optimum fab productivity to satisfy 5 nm node requirements.