Particle Sizing Systems

8203 Kristel Circle
Port Richey,  FL  34668

United States
  • Booth: A4479

Particle Sizing Systems offers the Accusizer Systems for Single Particle Optical Sizing SPOS. Different Lab versions and online systems are available. Major application in the semiconductor industry is the online control of CMP slurries  in order to detect oversized particles that could lead to unwanted scratches in the polishing process.   Standard measurement range  is 500 nm - 400 µm with the FX-Nano sensor it goes down to  150 nm - 200 µm.

The Nicomp particle sizer uses dynamic light scattering DLS to measure fine particles in the range 0.5 nm - 4 µm. It can be easily combined with Zeta potential measurement


  • Accusizer 7000
    Particle sizer based on Single Particle Optical Sizing SPOS technology, dedicated to detect and count oversized particles in polishing slurries for wafers. Lab systems for batch control or inline system for control of circulating slurries....

  • Measurement ranges:    500 nm - 400 µm  standard

                                          150 nm - 200 µm  FX Nano

    Measurement speed:    measures up to 0.5 Mio particles per min

    Measurement:    different Accusizer models:  SIS manual sample preparation, APS fully automated with 2 stage autodilution

    Options:    Autosampler for up to 96 samples, Autodilutor

  • Nicomp N3000
    Particle sizer based on Dynamic Light Scattering DLS for measurement of Nanoparticles size distribution. Availabe as lab instrument and for automated inline control....

  • Measurement range:    0.5 nm - 4 µm

    Measurement time:      typical 3-10 min

    Measurement:     single or automated with flow cell

    Options:    Autosampler with up to 96 samples, Zeta potential measurement

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