The Vistec SB254 is capable of handling and exposing transparent and non-transparent materials which are widely used in semiconductor and optical applications. Equipped with 50 kV Variable Shaped Beam electron optics, an address grid of 1 nm and an exposure platform with a stage travel range of 210 mm x 210 mm this system enables lithography below 20nm on various substrates from pieces up to 200 mm wafers and 7 inch masks.
As an optional feature, Cell Projection is also available. A Graphical User Interface (GUI) and fully automated cassette-to-cassette substrate handling, including substrate pre-alignment, allow the effective usage in an environment with consistently changing requirements. Furthermore the system features the data preparation software package ePLACE.
This electron-beam writer presents the evolutionary development of the successful and field-proven Vistec SB250 series.