Vistec Electron Beam GmbH

Ilmstrasse 4
Jena,  D-07743

  • Booth: A4375

We understand E-Beam

As a long-standing equipment supplier, Vistec Electron Beam GmbH is providing leading technology solutions for advanced electron-beam lithography. Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for: semiconductor manufacturing applications and advanced research as silicon direct write, compound semiconductor, silicon photonics, mask making as well as integrated optics and several new emerging markets.

The company’s roots go back to Carl Zeiss Jena when the first commercial Variable Shaped Beam system was introduced in the 1970s.

The company is located in Jena, Germany. In addition to its production facility in Germany, Vistec Electron Beam maintains service and support centers in Western Europe, Taiwan and the United States.


  • Vistec SB254
    The Vistec SB254 is a high performance, universal and cost effective electron-beam lithography system....

  • The Vistec SB254 is capable of handling and exposing transparent and non-transparent materials which are widely used in semiconductor and optical applications. Equipped with 50 kV Variable Shaped Beam electron optics, an address grid of 1 nm and an exposure platform with a stage travel range of 210 mm x 210 mm this system enables lithography below 20nm on various substrates from pieces up to 200 mm wafers and 7 inch masks.

    As an optional feature, Cell Projection is also available. A Graphical User Interface (GUI) and fully automated cassette-to-cassette substrate handling, including substrate pre-alignment, allow the effective usage in an environment with consistently changing requirements. Furthermore the system features the data preparation software package ePLACE.

    This electron-beam writer presents the evolutionary development of the successful and field-proven Vistec SB250 series.

  • Vistec SB3050 series
    The Vistec SB3050 Series is our commitment to semiconductor manufacturing professionals....

  • The Vistec SB3050 series is designed to meet the challanges of direct patterning down to the 32nm technology node, it features Variable Shaped Beam (VSB) technology with vector scan and continuously moving stage principles for throughput optimization. Our industrial proven 300mm design concept has been successfully materialized in more than 10 installations worldwide. The system can also be used for advanced optical applications.

    Key features
    - 50keV high-resolution electron optics with 1nm writing/address grid
    - 310x310mm stage travel to ensure full 300mm waver exposure capability
    - High troughput achieved by the "write-on-the-fly" principle combined with Flexible Stage Speed (FSS)
    - State of the art fully automated substrate handling with mini environment to satisfy the requirements of most advanced resist technologies
    - Wafer Mix & Match with optical lithography supported by production compatible correction methods
    - Integrated monitoring software for all critical process Parameters
    - High speed data processing allows fast data generation including flexible Proximity Effect Correction with distributed computing
    - small clean room footprint < 27m2 (SB3050)
    - SB3055 with Cell Projection Option for combined use with VSB principle for further troughput improvement

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