Let us talk about advanced thin-film processing!
We have over 40 years of experience in the manufacture of coating equipment, both for industrial production and for research and development. Thanks to this expertise, we have managed to supply over 140 vacuum coating systems for smaller substrates to our customers.
Based on various modular assembly systems, we offer flexible and customized systems in batch, load-lock, cluster or inline configuration. They are suited for silicon wafer-based products, three-dimensional objects and substrates with a coating width of up to one meter.
These systems can be applied in research and development and for production purposes in the semiconductor industry and sensor construction. They can also be used to manufacture products with optical precision coatings, micro-opto-electro-mechanicalsystems (MOEMS) or MEMS.
Our flexible systems for small substrates use all the important vacuum thin-film technologies such as PVD and PECVD. Beyond that, they can also apply thermal pre- and post-treatment solutions, etching methods with electron or ion beams and HIPIMPS and ALD technology.
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