Plasma deposition & etch tools for semiconductor processing
Run by a team with more than 200 years combined experience in design & build of dry plasma etch and deposition systems, CORIAL delivers complete production solutions for LED, MEMS ,general compound semiconductor processing and Failure Analysis (FA)
Our ICP-CVD, PECVD , RIE and ICP-RIE tools deliver precise, repeatable processes using robust, low maintenance reactor designs for lowest cost of ownership. Easy handling of multiple substrate sizes & process chemistries with flexible software for process set up, monitoring & control makes our tools the perfect choice from R&D process development up to large reactor sizes for production.
Choose from the Corial 200 or Corial 300 series tools according to your application,substrate size and throughput. CORIAL's team of application engineers at our new headquarters in Grenoble are here to help you optimise process results in silicon, III-V and II-VI compounds, dielectrics and metals processing.
To find out more visit us at www.corial.net
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