Innovative ion implant: Foundry & implanters manufacturing
PULSION®: PIII - Plasma Immersion ion implanter
Ultra-low energy (down to 100 eV) and conformal 3D implants.
Ideal for PV, material modification, DPG applications requiring very high doses.
IMC™: Research beamline ion implanter
The IMC series offers advanced research implantation of 60+ species on any substrates and outside of standard boundaries (+600°C, -100 °C).
FLEXion®: Specialized production ion implanter
The FLEXion® series offers volume production capacity at 200 keV or 400 keV single charge, optimized for SiC up to 600°C or III-V substrates.
Beam line implantation
More than 60 species available on any substrates (Si, SiC, GaN, InP, GaAs, LiNbO3, HgCdTe, Sapphire) at various energies or temperatures and from samples to 300mm.
with possible combination with laser annealing.
From design to complete processing (photolithography, etch, annealing, deposition, oxidation, RTA) on Si and SiC substrates.