The IVS200 tool is the system of choice for automated optical metrology when the factors reliability and flexibility are part of the key advantages required by your factory.
The tool has been designed to help Etch and Photolithography department to track any Critical Dimension or Overlay Registration trending and improve the process system SPC.
At our booth, you will be welcomed to see our system within a 3D display with all possible added values that you need demonstrated life.
The system runs at 90WP, with an MTBF of 1800H, it encapsulate a touch screen monitor on a Semi standard GUI to ease user' experience.
It measures CD, Bump and Overlay Registration within the same recipe. It interface the lastest GEM automation hosts.
The IVS200 system is able to handle from 3" to 8" wafers and substrates.