Inspectrology LLC

142 North Road Suite N
Sudbury,  MA  01775

United States
http://www.inspectrology.com
  • Booth: A4357


Automated CD & Overlay registration measurement system

At INSPECTROLOGY, we have the expertise required to introduce and maintain sucessfully your new automated optical measurement system for critical Dimension and Overlay Registration high TPUT in your facility. 

Your IVS200 system will allow the photolithography department to track the performanace of your aligner / stepper / scanners and associated tracks using our high performance image processing software. 

Our latest generation IVS200 incorporate a user friendly GUI, on the most cost effective platform to measure from 3" to 8" substrates of all kind including Silicon, GaN, GaAs, LiN, SiC, InP, Glass, Saphire, ....all of the compound semi substrates.

This year, we will welcome you at our Booth to show our capabilities and propose you a DEMO on your substatres if needed.

 Products

  • INSPECTROLOGY IVS200
    Best COO automated Optical Metrology system for CD, Via, film thickness and Overlay Registration measurement: the new IVS200 tool...

    • The IVS200 tool is the system of choice for automated optical metrology when the factors reliability and flexibility are part of the key advantages required by your factory. 

    The tool has been designed to help Etch and Photolithography department to track any Critical Dimension or Overlay Registration trending and improve the process system SPC. 

    At our booth, you will be welcomed to see our system within a 3D display with all possible added values that you need demonstrated life. 

    The system runs at 90WP, with an MTBF of 1800H, it encapsulate a touch screen monitor on a Semi standard GUI to ease user' experience.

    It measures CD, Bump and Overlay Registration within the same recipe. It interface the lastest GEM automation hosts.

    The IVS200 system is able to handle from 3" to 8" wafers and substrates.   

Categories

203 Inspection & Measurement Products
  • Defect; Particle; Bump; Contamination Detection, Review or Inspection
  • Film Thickness; Thickness; Uniformity Measurement; Ellipsometer
  • Flat; Notch Finding System
  • Line Width; Critical Dimension (CD) Measurement
  • Microscopes: Optical Microscopes
  • Overlay Measurement
    • 205 Nanotechnology Equipment and Tools
  • Equipment, Nanotechnology Tools
    • 500 Factory Monitoring & Control Systems (FMCS)
  • Process Controls
    • 602 Manufacturing Software
  • Production Control software
  • Yield Mgmt; Process Control Software
    • 700 Manufacturing Services
  • Calibration & Reference Standards
  • Certification; Compliance; Independent Laboratories
  • Etch; Strip; Cleaning Service
  • Lithography; Patterning service
  • Measurement; Inspection Service
  • Used; Rental Equipment; Inventory Reduction, Appraisal - Brokers; Resellers

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