Park Systems Corp.

Janderstrasse 5
Mannheim,  68199

  • Booth: B1666

AFM Metrology Solutions for Semiconductor and Wafer-Fab

Park Systems is world-leader in Nanoscale AFM Metrology Solutions for Hard Disk Market, Semiconductor and Wafer-Fab Manufacturing.

Playing a critical role in the development of AFM technology, Park Systems has remained the leading innovator in nanoscale microscopy and metrology throughout its 25-year-history and continues to invest in the development of new emerging technologies.

We offer a complete range of products for researchers and industry engineers in chemistry, materials, physics, life sciences, and semiconductor and data storage industries. Our comprehensive line of AFMs, with revolutionary features like True Non-Contact™ mode, offers users unparalleled accuracy and ease of use. Our tools are trusted to deliver ultra-high resolution with extremely precise measurements quickly and easily.


Park Systems Europe GmbH

Janderstrasse 5, 68199 Mannheim, Germany

+49 621 490-896-50


  • Park NX-3DM
    Park Systems has introduced the revolutionary Park 3DM Series, the completely automated AFM system designed for overhang profiles, high-resolution sidewall imaging, and critical angle measurements....

  • A fully automated industrial AFM using NX technology

    • NX technology automatically constructs an extremely accurate topographical image and collects essential dimensional data
    • The low noise Z-detector works on an independent, closed loop to minimize errors in topography
    • True Non-contact™ mode allow for the collection of high resolution and accurate data without tip-sample damage

    Innovative head design for undercut and overhang structures

    • Patented decoupled XY and Z scanning systems work together with the tilted Z-scanner, letting users overcome normal challenges in accurate sidewall analysis associated with normal and flare tip methods
    • Z-head tilting mechanism allows access to the sidewalls using an ultra-sharp tip to obtain the same high resolution and definition as is obtained over the rest of the material

    A Reliable, Seamless Measurement Tool for 3D materials

    • No sample preparation is required to obtain the sidewall roughness or critical dimension measurements in this process
    • By utilizing Z-head tilting and True Non-contact™ mode, the NX-3DM allows for both tip-preserving and high-resolution collection of sidewall data
  • Park NX-Wafer
    Unique features:<br />Low noise Atomic Force Profiler for accurate, high throughput CMP profile measurements<br />Sub-Angstrom surface roughness measured with extreme accuracy and minimized tip-to-tip variation<br />Smart ADR Software<br />...

  • With Park's Smart ADR NX-Wafer provides fully automated defect review and identification, enabling a critical inline process to classify defect types and source their origin through high resolution 3D imaging.
    Designed specifically for the semiconductor industry, Smart ADR is the most advanced defect review solution available, featuring automatic target positioning without the need for labor intensive reference marks that often damage the sample. The Smart ADR process improves productivity by up to 1,000% compared to traditional defect review methods. Additionally, the new ADR capability offers up to 20x longer tip life thanks to Park's groundbreaking True Non-Contact™ Mode AFM technology.

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  • Park NX20
    Park NX20, with its reputation as the world’s most accurate large sample AFM, is rated so highly in the semiconductor and hard disk industry for its data accuracy....

  • More powerful failure analysis solutions

    Park NX20 is equipped with unique features that make it easier to uncover the reasons behind device failure and develop more creative solutions. Its unparalleled precision provides high resolution data that lets you focus on your work, while its True Non-Contact™ mode scan keeps tips sharper and longer, so you won’t have to waste as much time and money replacing them.

    Easy to use, even for entry level engineers

    Park NX20 has one of the most user-friendly designs and automated interfaces in the industry, so you won’t have to spend as much time and energy using the tool and supervising junior engineers with the system. This lets you focus your experience on solving bigger problems and providing insightful and timely failure analysis to your customers.

  • Park NX20-300mm
    Designed for failure analysis and quality control laboratories, the new upgraded Park NX20 system can inspect an entire 300 mm wafer efficiently, without any need for cumbersome sample displacement....

  • Specifically Built for Large Sample Wafer Inspection

    The entire 300 mm wafer area can be analyzed for low-noise AFM measurements. This opens up a whole new scope of measurement automation, allowing engineers to work faster, more simply, and with greater precision.

    Proven NX20 Performance with a 300 mm sample stage

    With its enlarged platform that supports a 300mm motorized XY stage, the NX20 300 mm takes this a step further, allowing users to inspect larger samples easily and with extremely high accuracy.

    Park SmartScan™ makes getting accurate measurements simple

    The Park NX20 is equipped with our SmartScan OS, making it one of the easiest to use AFMs on the market. With an intuitive but extremely powerful interface, even untrained users can quickly scan a large sample without supervision.

    Optimized for a Wide Range of Applications

    With the ability to measure roughness, height and depth, perform defect reviews, electrical and magnetic failure analyses, thermal property characterization, and nanomechanical property imaging, the AFM is ideally suited to a wide range of tasks performed by FA, QA, and QC engineers that work with large samples.
  • Park NX-HDM
    Park NX-HDM is an AFM system that speeds up the defect review process by an order of magnitude through automated defect identification, scanning and analysis....

  • This AFM system links directly with a wide range of optical inspection tools, thus significantly increasing the automatic defect review throughput.

    Higher Throughput, Automatic Defect Review

    The task of identifying nanoscale defects is a very time-consuming process for engineers working with media and flat substrates. Park NX-HDM is an atomic force microscopy system that speeds up the defect review process by an order of magnitude through automated defect identification, scanning and analysis. Park NX-HDM links directly with a wide range of optical inspection tools, thus significantly increasing the automatic defect review throughput. 

    Sub-Angstrom, Surface Roughness Measurement

    Increasingly, industries require ultra-flat media and substrate to address the ever-shrinking device dimensions. Park NX-HDM provides accurate sub-angstrom surface roughness measurements, scan after scan. Park NX-HDM, together with its industry’s lowest noise floor, and its unique True Non-Contact™ technology, it is the most accurate AFM for surface roughness measurement in the market.

  • Park NX-PTR
    Park Systems' PTR Series is a fully automatic industrial in-line AFM solution for, but not limited to, automatic Pole Tip Recession measurements on Rowbar-level, individual Slider-level, and HGA-level sliders....

  • Inline Automation, for Fast, Accurate, and Repeatable PTR Measurements

    The hard disk drive slider manufacturing industry demands a tool that provides fast, streamlined Pole Tip Recession Measurements while still maintaining the highest standard of accuracy available. It demands a tool like the Park NX-PTR. The NX-PTR offers extremely accurate PTR measurements to process engineers with inline automation that increases throughput. This makes it the perfect solution for HDD slider manufacturers looking to maximize their quality and production yield.

    High Throughput, with No Need for Multiple Reference Scans

    Our crosstalk eliminated scan system allows for truly flat scans, effectively eliminating the multi-scan process. In addition, True Non-Contact Mode™ preserves tip sharpness for prolonged high-resolution imaging and much longer tip life. This lets the Park NX-PTR generate accurate images of highly detailed regions of interest within larger macrostructures, without any need of reference scan to correct various scanner artifacts.

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