Osiris International GmbH

Gewerbestr. 13
Moos,  78345

Germany
http://www.osiris-nano.com
  • Booth: B1476


We invite you to visit us on our booth B1-476.

Osiris International is a manufacturer of machines specializing in photolithographic process equipment used in semiconductor and microsystems (MEMS) technology.

The main application areas for surface treatment of wafers, substrates or masks are the following processing applications.

photoresist spin & spray coating, developing, baking,
wet cleaning, post CMP cleaning, etching, stripping & lift-off and
temporary bonding & debonding.

In addition to the production of our machines, which range from laboratory systems to semi-automatic and fully automatic systems, we also offer sub-systems such as PR Dispense Systems (Pumps, Syringe or CPD) and media supply cabinets with various canister designs.

We supply our technologies worldwide to major semiconductor manufacturers and internationally renowned research and development institutions.


 Products

  • OOPXX - DISPENSE PUMP SYSTEM
    The patented Osiris Oyster Pump is designed for highest dispense repeatability during the process and does not require sensor systems.......

  • DISPENSE PUMP SYSTEM
    OOPXX

    The patented Osiris Oyster Pump is designed for highest dispense repeatability during the process and does not require sensor systems. Using only a weight scale and all activity around are programmable.

    PROPERTIES
    ÷ For low & high material viscosity
    ÷ Accurate digital displays
    ÷ Exchangeable dispense reservoir
    ÷ No need of sensor systems
    ÷ A weighing scales for all measurements
    ÷ 100% consumption of the resist from the bottle
    ÷ Incl. suck-back valve
    ÷ Programmable dispense rate & speed
    ÷ Programmable automatic refilling and de-bubble systems
    ÷ Display of the actual fill level

  • VARIXX 804 - AUTOMATIC COMBINABLE CLUSTER SYSTEM
    Automatic cluster system can be fitted with different modules spin or spray coater......

  • AUTOMATIC COMBINABLE CLUSTER SYSTEM
    VARIXX 804

    Automatic cluster system can be fitted with different modules spin or spray coater, developer process module and with a temperature module tower (HMDS or hotplates and cool-plates).

    PROPERTIES
    ÷ Substrate sizes up to 200mm (round) or 6"x 6" (square)
    ÷ Flexible configuration of process modules
    ÷ Dual arm robotic system for increasing throughput
    ÷ On-the-fly product alignment
    ÷ Full edge handling (backside protected) or standard vacuum gripping
    ÷ Handling for thin, standard or bonded wafer (Si, glass & others)
    ÷ SECS/GEM interface
    ÷ Standard and customized chuck design

  • UNIXX SP 760 - SEMI-AUTOMATIC RESIST SPRAY COATER
    The spray coating system UNIXX SP760 is a new innovative and revolutionary spray coating concept that combines two different spray methods into one system....

  • SEMI-AUTOMATIC RESIST SPRAY COATER
    UNIXX SP 760

    The spray coating system UNIXX SP760 is a new innovative and
    revolutionary spray coating concept that combines two different
    spray methods into one system. With the newly developed method
    of 3D spray technology, for concave or convex (3D) surfaces, as
    well as the traditional in-line technology (2D) for flat substrates.

    PROPERTIES
    ÷ For flat, concave or convex surfaces
    ÷ Designed for large scale optical devices and different flat substrates sizes
    ÷ 6 axis robot system
    ÷ Up to two ultrasonic spray nozzles with automatic quickexchange function
    ÷ Integrated heating plate
    ÷ User-friendly operator interface


Send Email

Type your information and click "Send Email" to send an email to this exhibitor. To return to the previous screen without saving, click "Reset".