Atmospheric Plasma System for Surface Preparation
A rapid atmospheric process which reduces native oxidation and organic contamination.
Passivation of the surface against re-oxidation can also be performed – this process creates a few monolayers of modified surface that resist reaction and diffusion of oxygen – and yet is thin enough that it does not interfere with subsequent processes.
Ontos provides a simple, effective, clean surface modification method which does not require the throughput- robbing vacuum chamber associated with traditional plasma systems. Additionally, Ontos7 performs this surface modification without ion bombardment and without the cross-contamination issues often associated with conventional plasma systems.
Ontos is capable of handling both reducing or oxidizing chemistries.
Ontos performs these surface modification processes with only activated benign gasses (no halogens, no flammables, no toxics) in a low-energy atmospheric environment.