The osiris wet processing system for versatile application. Two system variations are available, with or without DI-water chamber rinse.
The sytem has an easy to operate user interface with all needed functions like, recipe programming, service, maintenance and
÷ Wafer up to 300mm
÷ Square substrates up to 9 x 9 inch
÷ Three integrated media supply systems for three different chemicals.
÷ Up to two electric media arms
÷ Wide range of nozzles available
÷ BSR nozzle for DI-Water
÷ Standard or customized chucks
÷ Manually operated & safety interlocked process chamber door
÷ Controller unit via 10 inch touch screen
÷ Designed for Institutes and R&D
OPTIONAL: (DI) Chamber rinse