Singulus Technologies AG

Hanauer Landstrasse 103
Kahl am Main,  D-63796

Germany
http://www.singulus.de
  • Booth: C1536


SINGULUS offers vacuum deposition & wet processing systems

SINGULUS TECHNOLOGIES
Innovations for New Technologies

SINGULUS TECHNOLGOIES builds innovative machines and systems for efficient and resource-friendly production processes. SINGULUS TECHNOLOGIES’ strategy is to take advantage of its existing core competencies and to expand these further.

The core competencies include vacuum coating, surface processing, wet-chemical and thermal production processes. The company offers machines, which are used worldwide in the solar, semiconductor, medical technology, consumer goods and optical disc sectors. For all of the machines, processes and applications SINGULUS TECHNOLOGIES harnesses its automation and process technology expertise.


 Products

  • ROTARIS Universal Sputtering System
    This sputter deposition system is ideal for deposition of multilayers with a high uniformity and a excellent thickness control. The ROTARIS design provides a rotating substrate deposition technology with the additional capability to tilt the substrate...

  • SINGULUS TECHNOLOGIES is a renowned manufacturer of advanced thin-film deposition equipment for MRAM, thin-film head, sensor and other semiconductor applications.

    The flexible sputter deposition system ROTARIS is ideal for deposition of multilayers with a very high uniformity and a excellent thickness control. The ROTARIS is a bridge system for 200 mm and 300 mm wafer processing. Its main deposition chamber, the Rotating-Substrate-Module, can be equipped with up to 12 sputtering cathodes with a target diameter of 100 mm.

    The ROTARIS design provides in particular a rotating substrate deposition technology with the additional capability to tilt the substrate. Additional features are “Co-sputtering” with up to four cathodes, DC-, pulsed DC-, RF-sputtering, wafer heating, and an in-situ aligning magnetic field. The installation of an ion source as alternative equipment allows for surface treatment and smoothing, ion milling and side wall cleaning.

    Advantages

    • High flexibility due up to 12 Targets in one deposition chamber
    • High throughput for multilayer deposition with short change time between the materials
    • Outstanding homogeneity
    • Excellent Sub-Å thickness control with high repeatability
    • Co-Sputtering opportunity with up to 4 cathodes
    • Qualified processes for production
    • Cost efficient solution

    ROTARIS

    Universal Sputtering System

    Download Broschure

    SINGULUS TECHNOLOGIES is a renowned manufacturer of advanced thin-film deposition equipment for MRAM, thin-film head, sensor and other semiconductor applications.

    The flexible sputter deposition system ROTARIS is ideal for deposition of multilayers with a very high uniformity and a excellent thickness control. The ROTARIS is a bridge system for 200 mm and 300 mm wafer processing. Its main deposition chamber, the Rotating-Substrate-Module, can be equipped with up to 12 sputtering cathodes with a target diameter of 100 mm.

    The ROTARIS design provides in particular a rotating substrate deposition technology with the additional capability to tilt the substrate. Additional features are “Co-sputtering” with up to four cathodes, DC-, pulsed DC-, RF-sputtering, wafer heating, and an in-situ aligning magnetic field. The installation of an ion source as alternative equipment allows for surface treatment and smoothing, ion milling and side wall cleaning.

    Advantages

    • High flexibility due up to 12 Targets in one deposition chamber
    • High throughput for multilayer deposition with short change time between the materials
    • Outstanding homogeneity
    • Excellent Sub-Å thickness control with high repeatability
    • Co-Sputtering opportunity with up to 4 cathodes
    • Qualified processes for production
    • Cost efficient solution

    ROTARIS Basic

    ROTARIS Basic sputtering system for processing up to 200 mm wafer.

    Example of configuration:

    • 1x Rotating-Substrate-Module RSM
    • 1x Manual wafer load lock

    ROTARIS Advanced

    ROTARIS Advanced sputtering system with additional modules for processing up to 200 mm wafer.

    Example of configuration:

    • 1 x Rotating-Substrate-Module RSM
    • 1 x Combi-Process-Module CMP
    • 1 x MX400 Central-Transport-Module CTM

    ROTARIS Diversity

    ROTARIS Diversity sputtering system with six modules for advanced processing up to 200 mm wafer.

    Example of configuration:

    • 3 x Rotating-Substrate-Module RSM
    • 1 x Combi-Process-Module CMP
    • 1 x Small-Thermal-Process-Module sTPM
    • 1 x MX700 Central-Transport-Module CTM
  • TIMARIS Ultra High Vacuum Deposition System
    The TIMARIS cluster tool is dedicated for the deposition of ultra-thin metallic and insulating films down to a thickness of one nanometer and below and stacks of such films with very precise material thickness and high uniformity specifications....

  • The TIMARIS cluster tool is dedicated for the deposition of ultra-thin metallic and insulating films down to a thickness of one nanometer and below and stacks of such films with very precise material thickness and high uniformity specifications. SINGULUS TECHNOLOGIES is a renowned manufacturer of advanced thin-film deposition equipment for MRAM, thin-film head, sensor and other semiconductor applications. It is the trusted partner in the respective industry and extends its leadership in the thin-film deposition technology for semiconductor applications. SINGULUS TECHNOLOGIES has already established and qualified the second generation of the TIMARIS PVD Cluster Tool platform in the market and is offering a complete portfolio of process modules for different applications.

    As of today, more than ten process modules are available to configure a TIMARIS system according to customer needs. These modules include the Multi-Target-Module, Oxidation-Process-Module, Pre-Clean-Module, Combi-Process-Module, Four-Target-Module and Static-Deposition-Module as well as the Rotating-Substrate-Module. The Rotating-Substrate-Module is the core module of the ROTARIS platform, our sputtering system with a high flexibility including co-sputtering. The TIMARIS PVD modules incorporate the full scope of sputtering techniques as: DC magnetron sputtering, pulsed DC magnetron sputtering and RF magnetron sputtering as well as combinations of these modes are selectable by recipe.

    Advantages

    • Up to 10 Targets in one deposition chamber
    • High throughput for multilayer deposition with short change time between the materials
    • Outstanding homogeneity due to the patented Linear Dynamic Deposition (Patent US 7,799,179)
    • Excellent Sub-Å thickness control with high repeatability
    • Very long target life with optimised coating efficiency
    • Low cost of ownership
    • Qualified processes for production

    .

  • Wet Bench Systems
    The SINGULUS product range starts with manual wet stations for R&D, semiautomated systems and up to fully automated tools for the chemical surface treatment like cleaning, etching and drying....

  • Wet Process Systems for Semiconductor Applications

    SINGULUS TECHNOLOGIES develops innovative technologies for efficient production processes. New production technology combined with sustainable processes and the use of novel materials can decouple the use of resources from economic growth in the long-term.

    The SINGULUS TECHNOLOGIES product range starts with manual wet stations for R&D, semiautomated systems and up to fully automated tools for the chemical surface treatment like cleaning, etching and drying. They are able to handle all wet processes in the front-end and back-end production area.

    SINGULUS TECHNOLOGIES also offers new process solution for the cleaning of metal-ceramic components. Metal-ceramic substrates made of silicon nitride have excellent thermal conductivity and excellent mechanical properties. The corresponding components are increasingly being used in high-performance electronics for the field of electromobility (hybrid and electric vehicles).

    Features

    • Up to 200 mm applications (double batch)
    • High uptime
    • Advanced process control
    • Compact footprint – integrated switch boxes
    • Upgradable by common and customized options
    • Tier-1 components (Iwaki, GF, GEMÜ, SMC, Festo, Siemens)
    • Platform executed for international industrial standards (CE, OSHA, UL)
    • Complies with: FM 4910, SEMI S2 and S8, SECS (if requested)
    • Third-party certification and US field labeling available
    • Fast installation and start-up according by modular design


    Range of products

    • Manual wet process stations
    • Semi- and fully automated wet process stations
    • Quartztube- and part-cleaning stations
    • Total metal free working stations
    • Special customer specified units
    • Chemical supply systems (pump or pressure systems)


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