Vistec Electron Beam GmbH

Ilmstr. 4
Jena,  D-07743

  • Booth: C1255

We understand E-Beam

As a long-standing equipment supplier, Vistec Electron Beam GmbH is providing leading technology solutions for advanced electron-beam lithography. Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for: semiconductor manufacturing applications and advanced research as silicon direct write, compound semiconductor, silicon photonics, mask making as well as integrated optics and several new emerging markets.

The company’s roots go back to Carl Zeiss Jena when the first commercial Variable Shaped Beam system was introduced in the 1970s.

The company is located in Jena, Germany. In addition to its production facility in Germany, Vistec Electron Beam maintains service and support centers in Western Europe, Taiwan and the United States.


  • Vistec SB254
    The Vistec SB254 E-Beam writers have been designed as universal and cost-effective tools for both direct write as well as mask making applications....

  • The concept of the SB254 enables handling and exposure of transparent and non-transparent compound semiconductor materials. The modular system architecture allows easy upgrades to a higher tool performance. Its flexibility and fully automated operation male the SB254 the ideal tool in industry and applied research.


    To meet the specific requirements of our customers the following features are optionally available:

    • Various substrate sizes and types supported by fully automated substrate handling incl. substrate pre-alignment
    • Multipass writing
    • MDSP (Mark Detection Software Package) incl. image field metric
    • Layout data preparation station covering up to 256 CPU cores for:

      • fracturing
      • plus additional Proximity Effect Correction (PROXECCO) and fogging correction options

    • Graphical User Interface (GUI) compliant to SEMI E95
    • Address grid down to 1nm

  • Vistec SB3050 series
    The Vistec SB3050 series is designed to meet the challenges of direct patterning down to the 32nm technology node, it features VSB technology with vector scan and continuously moving stage principles for throughput optimization....

  • The Vistec SB3050 series - with a Cell Projection option - is our commitment to semiconductor manufacturing professionals. Designed to meet the challenges of direct patterning down to the 32nm technology node, it features Variable Shape Beam (VSB) technology with vector scan and continuously moving stage principles for throughput optimization.

    Key features:

    • 50KeV high-resolution electron optics
    • 310x310mm stage travel
    •  write-on-the-fly principle & Flexible Stage Speed (FSS)
    • fully automated substrate handling
    • Wafer mix & match
    • CP

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