ADTEC Engineering, Ushio’s lithography subsidiary, is launching the DE-2 and DE-8 exposure systems at SEMICON Europa 2021. This allowed Ushio to add complete solutions for Direct Imaging (DI) Exposure for integrated circuit (IC) substrates and printed circuit board (PCB) processing to its portfolio. This also brings the partnership between ADTEC and Deca to the table, which will facilitate compatibility with Deca’s Adaptive Patterning™ technology.

Alongside Ushio’s large suite of steppers for MEMS, advanced packaging, and LCD manufacturing, ADTEC Engineering itself recently began expansion of its production site to keep up with growing demand from the lithography sector. Feel free to approach our colleagues at SEMICON Europa 2021, to discuss the options available to you for the DE-2 and DE-8 models.

Key Features: DE-2 Next Generation Direct-Write Exposure System

• DE-2 W300 for 300 mm wafers; DE-2 P600 for 600 mm x 600 mm panels
• Maskless Direct Imaging for fan-out WLP & PLP and high-precision packaging
• Minimum Line/Space = 2/2 μm imaging capability
• Overlay accuracy ≦ 1 μm
• Optional: Deca’s Adaptive Patterning™ connectivity

Contact:

ADTEC Engineering Co., Ltd.

Sales Dept., WLP Exposure Systems Div.
Phone： +81-(0)3-6369-9805
E-Mail： sales@adtec-eng.co.jp

• Novel 222nm light sources allows selective lithography process without use of a mask.  This allows lower system cost compared to other UV-C sources and also offer homogeneous irradiation.  USHIO's technology also offers mercury free environmentally friendly light source which enables instant On/Off.

The laser-produced plasma (LPP) EUV source is developed at Ushio Germany in cooperation with Fraunhofer ILT. The source utilizes a rotating disc target coated with liquid tin and a solid-state nanosecond laser. Its compact design has a potential to provide EUV photon to various applications. The source was designed to run at up to 50 kHz and the current tests are underway at 20 kHz. The source has a debris filter and a collector so that the focused EUV light is available at the intermediate focus point. At Semicon, the latest update on the development work will be presented. 

After entering the field of laser-produced plasma (LPP), Ushio has managed to create the brightest-ever EUV light source. With this achievement, Ushio has announced a new product, which is currently under development, for lithography inspection and medical applications. Despite breaking EUV luminosity records, Ushio’s LPP remains compact, versatile, and easy to maintain.

The laser-produced plasma (LPP) EUV source is being developed at Ushio Germany, in cooperation with Fraunhofer ILT. The source utilises a rotating disc target coated with liquid tin and a solid-state nanosecond laser. The compact design has a potential to provide EUV photons to various applications. The source was designed to run at up to 50 kHz, with current tests running at 20 kHz; additionally, the designs feature a debris filter and collector so that focused EUV light is available at the intermediate focus point.

Key Features: Brightest LPP-EUV Light Source

• Rotating liquid-tin covered disc target
• Easy-operation
• Small emission size: 100 x 45 mm² (at plasma)
• Stable output for hours/days
• Tin spectrum (l: 13.5 nm)

Ushio’s new LED heating modules are currently under development, but keeping to a theme of collaboration, the opinions and needs of potential customers are always at the front of the minds of Ushio engineers. Having already created a module that allows almost instantaneous heating in a fraction of a second, Ushio has mainly included features useful to customers interested in etching, deposition, and ion implantation. Those features have resulted in a compact, cost-effective LED heating module that boasts rapid and accurate temperature controls over the selected treatment area only.

Ushio presents its expertise in full-field projection exposure lithography tools, with the UX-4 Series Aligner improving production of micro-electromechanical systems (MEMS), powerful LEDs, and power devices.

Developed by the talented Japanese Ushio R&D team, UX-4 is equipped with a high quality lens for a large depth of field. Capable of full-field exposure of wafers up to 200 mm in diameter, UX-4 technology promotes a substantial improvement in productivity, while significantly reducing the cost of manufacture. With an optical irradiation system developed in-house, a high degree of homogeneity is ensured thanks to Ushio’s super high-pressure UV lamps (500 W ~ 35 kW). Designed in collaboration with device manufacturers, in response to their increasingly diverse needs, Ushio SH lamps are a highly-acclaimed tool in the litho-patterning industry.

SH Lamps

Ushio is the world’s largest supplier of super-high pressure (SH) lamps and commands a global reputation for high-quality, cutting-edge technology. Ushio is a named authorized brand of many top equipment manufacturers.

Solid State Lighting

• From UV to IR, Ushio is well-known for its fully in-house LED and Laser Diode manufacturing division. With an extensive collection of standard and customisable products, including the leading Ushio Epitex LED brand, Ushio is able to meet the needs of even the most innovative and unexpected ideas.

Linear and Bent IR Lamps

• Compact and Stable
• Homogenous Heating
• Fully Customisable
• Download the brochure: Infrared Lamps for Diverse Industrial Applications

Infrared Twin Tube Lamps

• High-level Radiation Density
• Various Filament Designs
• Optional Reflective Coating
• Download the flyer: High-Power Infrared Irradiation with Twin Tube Lamps

Excimer

• Hyper V-ST: High-power compact excimer unit for surface activation and treatment. A compact, convenient, and cost-effective module with optional N₂ purge.
• 222 nm excimer lamps: Novel 222 nm exposure, which brings homogeneous irradiation without an optical system, enables higher wafer processing speeds (6” to 12”). Ushio’s instant on and off excimer di-electric barrier discharge lamps are mercury-free, and therefore, environmentally friendly.
• Find out more about excimer on Ushio Europe’s Excimer: The Technology Explained page.