Oxford Instruments

North End Road, Yatton
Bristol,  North Somerset  BS49 4AP

United Kingdom
https://plasma.oxinst.com
  • Booth: B1151


Oxford Instruments, World Leader in Plasma Process Solutions

Oxford Instruments Plasma Technology is a leading provider of etch and deposition process solutions for nanometre-sized features, nanolayers, and the controlled growth of nanostructures. These solutions are based on core technologies in plasma, ion beam and atomic layer deposition and etch. Products range from clustered cassette-to-cassette platforms for high-throughput production processing to compact stand-alone systems for R&D.

We provide a range of technologies including Atomic Layer Deposition, Atomic Layer Etching, CVD, Deep Silicon Etching, ICP Etching, ICPCVD, Ion Beam Etching, Ion Beam Deposition, PECVD and Reactive Ion Etching


 Press Releases

  • 20 May 2021

    Oxford Instruments announces first Virtual Symposium on Quantum Technology, Semiconductors, and Power Generation.

    Oxford Instruments plc is pleased to announce its first Virtual Symposium on Quantum Technology, Semiconductors, and Power Generation, taking place on June 8th-10th, 2021 under the motto “Helping the experts of today take on the challenges of tomorrow”.

    With over ten confirmed international speakers, this interactive digital event will bring stakeholders from industry and academia together and facilitate collaboration among peers. Talks include presentations by Dr. Hugo Defienne from the University of Glasgow School of Physics and Astronomy, Dr. Abou Ras from the Helmholtz Institute Berlin for Materials and Energy, and  Dr. Matthew Hutchings from SeeQC.

    During this free event, participants will have the opportunity to gain actionable insights from industry and research experts and liaise with application specialists in their areas of interest during presentations and poster sessions.

    The virtual symposium experience will be rounded up by an online exhibition area showcasing solutions in the fields of atomic force microscopy, electron microscopy (EBSD, EDS, WDS), etch and deposition tools, low-temperature systems, dilution refrigerators, optical imaging, high-speed confocal microscopy, analysis software, and nuclear magnetic resonance.

    Exclusive to registered participants, all presentations will be available on the platform for a limited amount of time after the conference, along with market-specific resources such as white papers, application notes, technical handbooks, videos, and product selection guides.

    Find out more or submit an abstract: https://www.oxinst.com/events/quantum-technology,-semiconductors-and-power-generation-virtual-symposium

    Register today: https://oxinst.6connex.eu/event/virtual/login

    For more information, please contact melanie.lesage@oxinst.com, Group Head of Marketing.

    - Ends -

    Issued for and on behalf of Oxford Instruments plc

    Friday, 17 September 2021

     

     

    About Oxford Instruments plc

    Oxford Instruments designs, supplies and supports high-technology tools and systems with a focus on research and industrial applications. Innovation has been the driving force behind Oxford Instruments' growth and success for 60 years, supporting its core purpose to address some of the world’s most pressing challenges. 

    The first technology business to be spun out from Oxford University, Oxford Instruments is now a global company and is listed on the FTSE250 index of the London Stock Exchange (OXIG).  Its strategy focuses on being a customer-centric, market-focused Group, understanding the technical and commercial challenges faced by its customers. Key market segments include Semiconductor & Communications, Advanced Materials, Healthcare & Life Science, and Quantum Technology.

    Their portfolio includes a range of core technologies in areas such as low temperature and high magnetic field environments; Nuclear Magnetic Resonance; X-ray, electron, laser and optical based metrology; atomic force microscopy; optical imaging; and advanced growth, deposition and etching.

    Oxford Instruments is helping enable a greener economy, increased connectivity, improved health and leaps in scientific understanding. Their advanced products and services allow the world’s leading industrial companies and scientific research communities to image, analyse and manipulate materials down to the atomic and molecular level, helping to accelerate R&D, increase manufacturing productivity and make ground-breaking discoveries.

  • 7th May 2021

    Construction has begun at Oxford Instruments Plasma Technology’s advanced manufacturing facility.

    Oxford Instruments Plasma Technology, a leading provider of advanced wafer processing solutions for the semiconductor industry, has today broken ground at the site of their new state-of-the-art manufacturing facility in Bristol, UK. 

    The relocation to a new facility is driven by the growing demand for Plasma Technology’s solutions from their customers, which include the world’s leading semiconductor device manufacturers and materials research institutions.

    Managing Director of Plasma Technology, Matt Kelly, comments: “We are thrilled to be moving forward with construction at the new facility and we’re excited to see the project progress. Our new building will comprise both a state-of-the-art manufacturing facility, as well as advanced research laboratories which will support our leading-edge developments and enable the future innovations of our customers.”

    Strong growth in the last 4 years has seen the company grow to over 400 employees worldwide, with over 300 of these working across the laboratory, office and manufacturing space at the current Plasma Technology UK headquarters in Yatton, near Bristol.

    Mark Wright, Partner at Trebor Developments, who is managing the project, said: “we are delighted to commence construction of such a prestigious high tech, manufacturing and office facility. The building will comprise 107,660 sq. ft with an extensive additional fit-out.”

    For many years, Oxford Instruments Plasma Technology has focused their expertise on Compound Semiconductors (CS) and optimised their robust hardware making it suitable for operation in the semiconductor Fab - delivering critical device performance, yield and cost of ownership to enable their customers to succeed. The markets for CS applications, such as GaN fast chargers and SiC power devices, are showing exciting growth and this success is driving the need for expansion. The evolution of Plasma Technology into the semiconductor production space, combined with the increased demand for their systems, not only calls for additional space, but also requires a state-of-the-art facility to further enhance their capability as a production supplier.

    - Ends -

    Issued for and on behalf of Oxford Instruments Plasma Technology

    For further information and electronic copies of the images please contact:

    Claire Critchell, Marketing Communications Manager, Oxford Instruments Plasma Technology

    E: Claire.critchell@oxinst.com | T:  +44 (0)7776171943

    About Oxford Instruments Plasma Technology

    Oxford Instruments Plasma Technology offers flexible, configurable process tools and leading-edge processes for the precise, controllable and repeatable engineering of micro- and nano-structures. Our systems provide process solutions for the etching of nanometre sized features, nanolayer deposition and the controlled growth of nanostructures.

    These solutions are based on core technologies in plasma-enhanced deposition and etch, ion-beam deposition and etch, atomic layer deposition, deep silicon etch and physical vapour deposition. Products range from compact stand-alone systems for R&D, through batch tools and up to clustered cassette-to-cassette platforms for high-throughput production processing.

    About Oxford Instruments plc

    Oxford Instruments designs, supplies and supports high-technology tools and systems with a focus on research and industrial applications. Innovation has been the driving force behind Oxford Instruments' growth and success for 60 years, supporting its core purpose to address some of the world’s most pressing challenges. 

    The first technology business to be spun out from Oxford University, Oxford Instruments is now a global company and is listed on the FTSE250 index of the London Stock Exchange (OXIG).  Its strategy focuses on being a customer-centric, market-focused Group, understanding the technical and commercial challenges faced by its customers. Key market segments include Semiconductor & Communications, Advanced Materials, Healthcare & Life Science, and Quantum Technology.

    Their portfolio includes a range of core technologies in areas such as low temperature and high magnetic field environments; Nuclear Magnetic Resonance; X-ray, electron, laser and optical based metrology; atomic force microscopy; optical imaging; and advanced growth, deposition and etching.

    Oxford Instruments is helping enable a greener economy, increased connectivity, improved health and leaps in scientific understanding. Their advanced products and services allow the world’s leading industrial companies and scientific research communities to image, analyse and manipulate materials down to the atomic and molecular level, helping to accelerate R&D, increase manufacturing productivity and make ground-breaking discoveries.

  • 12 August 2021

    Chart, sunburst chart

Description automatically generatedUniversity of Louisville selects Oxford Instruments Plasma Technology’s deep silicon etch solutions for leading edge research

    Oxford Instruments Plasma Technology, a leading provider of plasma etching and deposition solutions to the compound semiconductor industry, is pleased to announce that it has received an order for a PlasmaPro 100 Estrelas plasma etching system from the Micro/Nano Technology Center (MNTC) in the
    J. B. Speed School of Engineering at the University of Louisville.

    The system purchased by the University of Louisville will be added to the suite of fabrication equipment in the university’s $30M 10,000 ft2 cleanroom, which is part of the prestigious NSF National Nanotechnology Network.

    The PlasmaPro 100 Estrelas platform is designed to support research, development, and training.  It provides total flexibility for Deep Silicon Etch (DSiE) or Deep Reactive Ion Etch (DRIE) applications with the unique capability to perform Bosch, cryo DSiE and deep oxide/nitride etching on the same platform without hardware changes. The flexibility serves a diverse set of process requirements for Micro Electromechanical Systems (MEMS), advanced packaging and nanotechnology markets.

    The Bosch DSiE uses a high-density plasma source and fast gas-switching capabilities to achieve profile verticality and high etching rates with excellent selectivity to masking materials. Cryo DSiE uses ultra-low temperatures so produce features with smooth sidewalls.

    Julia Aebersold, Manager of the MNTC says, “We are excited to upgrade our current DRIE capabilities significantly with Oxford’s Estrelas DSiE system.  The new system will allow our clients to achieve critical design parameters needed for sidewall smoothness and SOI etch termination for microfluidics, robotics and gas diagnostic sensors that we were not able to achieve before.”

    “Oxford Instruments has enjoyed a successful collaborative relationship with the University of Louisville and we are committed to continue to demonstrate our wafer processing technology leadership based on more than thirty five years of experience and innovation. The University of Louisville has other wafer processing solutions from Oxford Instruments installed at their facility and we are excited to be selected again to provide the best fabrication tools applicable for their research and educational training." Says Emiel Thijssen, VP Sales and Business Development, Oxford Instruments Plasma Technology, Americas.

    - Ends -

    Issued for and on behalf of Oxford Instruments Plasma Technology

     

     

    For further information and electronic copies of the images please contact:

    Claire Critchell, Marketing Communications Manager, Oxford Instruments Plasma Technology

    E: Claire.critchell@oxinst.com | T:  +44 (0) 7776 171943

    About Oxford Instruments Plasma Technology

    Oxford Instruments Plasma Technology offers flexible, configurable process tools and leading-edge processes for the precise, controllable and repeatable engineering of micro- and nano-structures. Our systems provide process solutions for the etching of nanometre sized features, nanolayer deposition and the controlled growth of nanostructures.

    These solutions are based on core technologies in plasma-enhanced deposition and etch, ion-beam deposition and etch, atomic layer deposition, deep silicon etch and physical vapour deposition. Products range from compact stand-alone systems for R&D, through batch tools and up to clustered cassette-to-cassette platforms for high-throughput production processing.

    About Oxford Instruments plc

    Oxford Instruments designs, supplies, and supports high-technology tools and systems with a focus on research and industrial applications. Innovation has been the driving force behind Oxford Instruments' growth and success for 60 years, supporting its core purpose to address some of the world’s most pressing challenges. 

    The first technology business to be spun out from Oxford University, Oxford Instruments is now a global company and is listed on the FTSE250 index of the London Stock Exchange (OXIG).  Its strategy focuses on being a customer-centric, market-focused Group, understanding the technical and commercial challenges faced by its customers. Key market segments include Semiconductor & Communications, Advanced Materials, Healthcare & Life Science, and Quantum Technology.

    Their portfolio includes a range of core technologies in areas such as low temperature and high magnetic field environments; Nuclear Magnetic Resonance; X-ray, electron, laser, and optical based metrology; atomic force microscopy; optical imaging; and advanced growth, deposition and etching.

    Oxford Instruments is helping enable a greener economy, increased connectivity, improved health and leaps in scientific understanding. Their advanced products and services allow the world’s leading industrial companies and scientific research communities to image, analyse and manipulate materials down to the atomic and molecular level, helping to accelerate R&D, increase manufacturing productivity and make ground-breaking discoveries.

  • 10 February 2021

    Oxford Instruments Plasma Technology helps drive commercialisation of 2D devices with the European Graphene Flagship funded pilot line.

    Oxford Instruments Plasma Technology, a leading supplier of plasma processing solutions for high volume manufacturing and research and development (R&D), is pleased to announce its involvement in the European Graphene Flagship funded pilot line. Leading European semiconductor foundries and research institutions are working together in the Graphene Flagship-funded pilot line to bring two-dimensional (2D) materials from the laboratory into commercial devices. 

    Oxford Instruments is proud to be the exclusive Atomic Layer Deposition (ALD) hardware and process solution partner in this cross-European collaboration named the “2D Experimental Pilot Line”, continuing its strategy of working with innovative global partners to translate leading research into the manufacturing environment, pushing technology and device performance. This programme is funded by the European Commission, who will invest 20 million euros over 4 years. Started on 1 October 2020, the project will establish a European ecosystem for prototype production of 2D materials-based electronics, photonics, and sensors.

    2D materials have been proven to enable superior device performance across a wide range of applications such as sensors & photonics.  The next step needed to bring these devices to market is to develop the processing flow for full wafers. Oxford Instruments is ideally positioned to help take the technology to the next level with a clear roadmap to single wafer plasma processing solutions on 200 mm wafers.

    Oxford Instruments has successfully installed its Atomfab remote plasma ALD system at AMO Aachen to support the manufacture of these devices on 200 mm wafers.  The innovative plasma ALD system has demonstrated the capability to deposit high quality high-K materials onto 2D materials with no layer damage. Atomfab was designed specifically for high volume manufacturing with market leading throughput and cost of ownership for remote plasma ALD delivered on a single wafer processing platform handling wafers up to 200 mm diameter. 

    “The new ALD tool will help AMO and the 2D Experimental Pilot Line (2D-EPL) to move research on 2D materials to higher manufacturing readiness levels”, says AMO’s director Prof. Max Lemme. “We are not merely talking about yet another tool, but about a strategic partnership between AMO and Oxford Instruments, with a dedicated Oxford Instruments scientist embedded at AMO to intensify the research and development on 2D materials. This close collaboration is a beautiful example for AMO’s mission to pursue technology transfer through joint R&D projects with industrial partners.”

    Klaas Wisniewski, Strategic Business Development Director at Oxford Instruments Plasma Technology comments: “The equipment demand for next generation material devices has reached a new level. What is required are high-performance and at the same time cost-efficient solutions - criteria that cannot always be easily reconciled and can therefore only be implemented with superior process technology. We are therefore very pleased that this pioneering pilot line   with access to the world leading device manufacturers will take full advantage of our advanced Atomfab ALD technology. By working together in such world leading consortia, we continue to build on our strategy of enabling the manufacture of high-performance devices by investing in promising technologies such as 2D materials today.”

    Cedric Huyghebaert, program manager for exploratory material and module integration at imec, and technical leader of the 2D-EPL project states: “Over the past decade, research has unearthed some unique properties of two-dimensional materials that show potential for solving some key performance bottlenecks for future electronic and photonic devices and  sensors”, “While there are many demonstrations of lab type prototype devices showing  performances beyond the state-of-the-art,  to bring these devices into the market we need to develop tool kits and BKMs for manufacturing of 2D materials which are compatible with the standards of semiconductor industry. Imec is leading the 2D experimental pilot line effort to build an industrial ecosystem needed to drive up technology readiness of 2D materials and we are looking forward to working with Oxford Instruments and other tool and material vendors in this consortium.”

    Oxford Instruments continues to develop and support market-leading atomic scale fabrication solutions vital to the fabrication of 2D materials enabled devices. 


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